Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition
Abstract We developed a newly designed system based on in situ monitoring with Fourier transform infrared (FT-IR) spectroscopy and quadrupole mass spectrometry (QMS) for understanding decomposition mechanism and by-products of vaporized Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) du...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2020-09-01
|
| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | http://link.springer.com/article/10.1186/s11671-020-03400-2 |
| _version_ | 1797716728194531328 |
|---|---|
| author | Jong-Ki An Eunmi Choi Seob Shim Hayeong Kim Goru Kang Ju-Young Yun |
| author_facet | Jong-Ki An Eunmi Choi Seob Shim Hayeong Kim Goru Kang Ju-Young Yun |
| author_sort | Jong-Ki An |
| collection | DOAJ |
| description | Abstract We developed a newly designed system based on in situ monitoring with Fourier transform infrared (FT-IR) spectroscopy and quadrupole mass spectrometry (QMS) for understanding decomposition mechanism and by-products of vaporized Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) during the move to process chamber at various temperatures because thermal decomposition products of unwanted precursors can affect process reliability. The FT-IR data show that the –CH3 peak intensity decreases while the –CH2– and C=N peak intensities increase as the temperature is increased from 100 to 250 °C. This result is attributed to decomposition of the dimethylamido ligands. Based on the FT-IR data, it can also be assumed that a new decomposition product is formation at 250 °C. While in situ QMS analysis demonstrates that vaporized CpZr(NMe2)3 decomposes to N-ethylmethanimine rather than methylmethyleneimine. The in situ monitoring with FT-IR spectroscopy and QMS provides useful information for understanding the behavior and decomposes of CpZr(NMe2)3 in the gas phase, which was not proven before. The study to understand the decomposition of vaporized precursor is the first attempt and can be provided as useful information for improving the reliability of a high- advanced ultra-thin film deposition process using atomic layer deposition in the future. |
| first_indexed | 2024-03-12T08:25:52Z |
| format | Article |
| id | doaj.art-71fa613280274261bf083e586891aef0 |
| institution | Directory Open Access Journal |
| issn | 1556-276X |
| language | English |
| last_indexed | 2024-03-12T08:25:52Z |
| publishDate | 2020-09-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nanoscale Research Letters |
| spelling | doaj.art-71fa613280274261bf083e586891aef02023-09-02T18:07:48ZengSpringerOpenNanoscale Research Letters1556-276X2020-09-011511910.1186/s11671-020-03400-2Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer DepositionJong-Ki An0Eunmi Choi1Seob Shim2Hayeong Kim3Goru Kang4Ju-Young Yun5New Product Development Department, Wonik IPSVacuum Materials Measurement Team, Korea Research Institute of Standards and Science (KRISS)Liquid Processing & Casting R&D Group, Korea Institute of Industrial TechnologyVacuum Materials Measurement Team, Korea Research Institute of Standards and Science (KRISS)Vacuum Materials Measurement Team, Korea Research Institute of Standards and Science (KRISS)Vacuum Materials Measurement Team, Korea Research Institute of Standards and Science (KRISS)Abstract We developed a newly designed system based on in situ monitoring with Fourier transform infrared (FT-IR) spectroscopy and quadrupole mass spectrometry (QMS) for understanding decomposition mechanism and by-products of vaporized Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) during the move to process chamber at various temperatures because thermal decomposition products of unwanted precursors can affect process reliability. The FT-IR data show that the –CH3 peak intensity decreases while the –CH2– and C=N peak intensities increase as the temperature is increased from 100 to 250 °C. This result is attributed to decomposition of the dimethylamido ligands. Based on the FT-IR data, it can also be assumed that a new decomposition product is formation at 250 °C. While in situ QMS analysis demonstrates that vaporized CpZr(NMe2)3 decomposes to N-ethylmethanimine rather than methylmethyleneimine. The in situ monitoring with FT-IR spectroscopy and QMS provides useful information for understanding the behavior and decomposes of CpZr(NMe2)3 in the gas phase, which was not proven before. The study to understand the decomposition of vaporized precursor is the first attempt and can be provided as useful information for improving the reliability of a high- advanced ultra-thin film deposition process using atomic layer deposition in the future.http://link.springer.com/article/10.1186/s11671-020-03400-2Thermal propertiesIn situ monitoringFTIR&QMSPrecursorCpZr[N(CH3)2]3 |
| spellingShingle | Jong-Ki An Eunmi Choi Seob Shim Hayeong Kim Goru Kang Ju-Young Yun Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition Nanoscale Research Letters Thermal properties In situ monitoring FTIR&QMS Precursor CpZr[N(CH3)2]3 |
| title | Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition |
| title_full | Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition |
| title_fullStr | Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition |
| title_full_unstemmed | Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition |
| title_short | Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition |
| title_sort | thermal decomposition in situ monitoring system of the gas phase cyclopentadienyl tris dimethylamino zirconium cpzr nme2 3 based on ft ir and qms for atomic layer deposition |
| topic | Thermal properties In situ monitoring FTIR&QMS Precursor CpZr[N(CH3)2]3 |
| url | http://link.springer.com/article/10.1186/s11671-020-03400-2 |
| work_keys_str_mv | AT jongkian thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition AT eunmichoi thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition AT seobshim thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition AT hayeongkim thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition AT gorukang thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition AT juyoungyun thermaldecompositioninsitumonitoringsystemofthegasphasecyclopentadienyltrisdimethylaminozirconiumcpzrnme23basedonftirandqmsforatomiclayerdeposition |