Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation
A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO2) layer using a thermal oxidation process. The process aims not onl...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-05-01
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Series: | Micromachines |
Subjects: | |
Online Access: | http://www.mdpi.com/2072-666X/9/5/222 |