Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors
We investigate the growth conditions for thin ( ${\leqslant}200$ nm) sputtered aluminum films. These coatings are needed for various applications, e.g. for advanced manufacturing processes in the aerospace industry or for nanostructures for quantum devices. Obtaining high-quality films, with low rou...
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Format: | Article |
Language: | English |
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IOP Publishing
2023-01-01
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Series: | Materials for Quantum Technology |
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Online Access: | https://doi.org/10.1088/2633-4356/ace490 |
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author | Rasmus Flaschmann Christian Schmid Lucio Zugliani Stefan Strohauer Fabian Wietschorke Stefanie Grotowski Björn Jonas Manuel Müller Matthias Althammer Rudolf Gross Jonathan J Finley Kai Müller |
author_facet | Rasmus Flaschmann Christian Schmid Lucio Zugliani Stefan Strohauer Fabian Wietschorke Stefanie Grotowski Björn Jonas Manuel Müller Matthias Althammer Rudolf Gross Jonathan J Finley Kai Müller |
author_sort | Rasmus Flaschmann |
collection | DOAJ |
description | We investigate the growth conditions for thin ( ${\leqslant}200$ nm) sputtered aluminum films. These coatings are needed for various applications, e.g. for advanced manufacturing processes in the aerospace industry or for nanostructures for quantum devices. Obtaining high-quality films, with low roughness, requires precise optimization of the deposition process. To this end, we tune various sputtering parameters such as the deposition rate, temperature and power, which enables 50 nm thin films with a root mean square roughness of less than 1 nm and high reflectivity. Finally, we confirm the high-quality of the deposited films by realizing superconducting single-photon detectors integrated into multi-layer heterostructures consisting of an aluminum mirror and a silicon dioxide dielectric spacer. We achieve an improvement in detection efficiency at 780 nm from 40% to 70% by this integration approach. |
first_indexed | 2024-03-12T23:44:30Z |
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id | doaj.art-73a5a151a2754225b036c9e67877ac4c |
institution | Directory Open Access Journal |
issn | 2633-4356 |
language | English |
last_indexed | 2024-03-12T23:44:30Z |
publishDate | 2023-01-01 |
publisher | IOP Publishing |
record_format | Article |
series | Materials for Quantum Technology |
spelling | doaj.art-73a5a151a2754225b036c9e67877ac4c2023-07-14T12:02:37ZengIOP PublishingMaterials for Quantum Technology2633-43562023-01-013303500210.1088/2633-4356/ace490Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectorsRasmus Flaschmann0https://orcid.org/0000-0003-0884-3654Christian Schmid1Lucio Zugliani2Stefan Strohauer3https://orcid.org/0000-0002-3238-5641Fabian Wietschorke4https://orcid.org/0000-0002-3612-211XStefanie Grotowski5Björn Jonas6Manuel Müller7https://orcid.org/0000-0002-8039-6265Matthias Althammer8https://orcid.org/0000-0003-1625-6054Rudolf Gross9https://orcid.org/0000-0003-4524-7552Jonathan J Finley10Kai Müller11Walter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyTUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Walther-Meißner-Institut, Bayerische Akademie der Wissenschaften , Garching 85748, GermanyTUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Walther-Meißner-Institut, Bayerische Akademie der Wissenschaften , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyTUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Walther-Meißner-Institut, Bayerische Akademie der Wissenschaften , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Natural Sciences, Department of Physics, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWalter Schottky Institut, Technical University of Munich , Garching 85748, Germany; TUM School of School of Computation, Information and Technology, Department of Electrical Engineering, Technical University of Munich , Garching 85748, Germany; Munich Center for Quantum Science and Technology (MCQST) , Munich 80799, GermanyWe investigate the growth conditions for thin ( ${\leqslant}200$ nm) sputtered aluminum films. These coatings are needed for various applications, e.g. for advanced manufacturing processes in the aerospace industry or for nanostructures for quantum devices. Obtaining high-quality films, with low roughness, requires precise optimization of the deposition process. To this end, we tune various sputtering parameters such as the deposition rate, temperature and power, which enables 50 nm thin films with a root mean square roughness of less than 1 nm and high reflectivity. Finally, we confirm the high-quality of the deposited films by realizing superconducting single-photon detectors integrated into multi-layer heterostructures consisting of an aluminum mirror and a silicon dioxide dielectric spacer. We achieve an improvement in detection efficiency at 780 nm from 40% to 70% by this integration approach.https://doi.org/10.1088/2633-4356/ace490temperatureRMSgrainSNSPDaluminumroughness |
spellingShingle | Rasmus Flaschmann Christian Schmid Lucio Zugliani Stefan Strohauer Fabian Wietschorke Stefanie Grotowski Björn Jonas Manuel Müller Matthias Althammer Rudolf Gross Jonathan J Finley Kai Müller Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors Materials for Quantum Technology temperature RMS grain SNSPD aluminum roughness |
title | Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors |
title_full | Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors |
title_fullStr | Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors |
title_full_unstemmed | Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors |
title_short | Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors |
title_sort | optimizing the growth conditions of al mirrors for superconducting nanowire single photon detectors |
topic | temperature RMS grain SNSPD aluminum roughness |
url | https://doi.org/10.1088/2633-4356/ace490 |
work_keys_str_mv | AT rasmusflaschmann optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT christianschmid optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT luciozugliani optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT stefanstrohauer optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT fabianwietschorke optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT stefaniegrotowski optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT bjornjonas optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT manuelmuller optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT matthiasalthammer optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT rudolfgross optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT jonathanjfinley optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors AT kaimuller optimizingthegrowthconditionsofalmirrorsforsuperconductingnanowiresinglephotondetectors |