Enhanced photo/electroluminescence properties of Eu-doped GaN through optimization of the growth temperature and Eu related defect environment

The influence of growth temperature on the surface morphology and luminescence properties of Eu-doped GaN layers grown by organometallic vapor phase epitaxy was investigated. By using a Eu source that does not contain oxygen in its molecular structure, and varying the growth temperature, the local d...

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Bibliographic Details
Main Authors: W. Zhu, B. Mitchell, D. Timmerman, A. Uedono, A. Koizumi, Y. Fujiwara
Format: Article
Language:English
Published: AIP Publishing LLC 2016-05-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.4950826
Description
Summary:The influence of growth temperature on the surface morphology and luminescence properties of Eu-doped GaN layers grown by organometallic vapor phase epitaxy was investigated. By using a Eu source that does not contain oxygen in its molecular structure, and varying the growth temperature, the local defect environment around the Eu3+ ions was manipulated, yielding a higher emission intensity from the Eu3+ ions and a smoother sample surface. The optimal growth temperature was determined to be 960 °C and was used to fabricate a GaN-based red light-emitting diode with a significantly higher output power.
ISSN:2166-532X