Multilayer ion trap technology for scalable quantum computing and quantum simulation

Multilayer ion trap technology for scalable quantum computing and quantum simulation

We present a novel ion trap fabrication method enabling the realization of multilayer ion traps scalable to an in principle arbitrary number of metal-dielectric levels. We benchmark our method by fabricating a multilayer ion trap with integrated three-dimensional microwave circuitry. We demonstrate...

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Bibliographic Details
Main Authors: A Bautista-Salvador, G Zarantonello, H Hahn, A Preciado-Grijalva, J Morgner, M Wahnschaffe, C Ospelkaus
Format: Article
Language:English
Published: IOP Publishing 2019-01-01
Series:New Journal of Physics
Subjects:
surface-electrode ion trap
atom chip
microfabrication
quantum logic and simulation
Online Access:https://doi.org/10.1088/1367-2630/ab0e46

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