Optical Recrystallization of Nanocrystalline Silicon Ribbons

The Silicon on Dust Substrate (SDS) is a gas-to-wafer process that produces multicrystalline silicon ribbons directly from gaseous feedstock (silane), avoiding the standard industry steps of polysilicon deposition, crystal growth, and wafering. The SDS technique consists of three main steps: (i) mic...

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Main Authors: Filipe Serra, Ivo Costa, José A. Silva, João M. Serra
Format: Article
Language:English
Published: MDPI AG 2023-02-01
Series:Metals
Subjects:
Online Access:https://www.mdpi.com/2075-4701/13/3/452
_version_ 1797610142315839488
author Filipe Serra
Ivo Costa
José A. Silva
João M. Serra
author_facet Filipe Serra
Ivo Costa
José A. Silva
João M. Serra
author_sort Filipe Serra
collection DOAJ
description The Silicon on Dust Substrate (SDS) is a gas-to-wafer process that produces multicrystalline silicon ribbons directly from gaseous feedstock (silane), avoiding the standard industry steps of polysilicon deposition, crystal growth, and wafering. The SDS technique consists of three main steps: (i) micrometric-sized silicon powder production by grinding silicon chunks; (ii) chemical vapor deposition (CVD) of silicon over this silicon powder substrate; and (iii) zone-melting recrystallization (ZMR) of the nanocrystalline pre-ribbon obtained in the CVD step. Several samples were produced by this technique. During CVD, mechanically self-sustained nanocrystalline pre-ribbons were grown over silicon powder substrates, with growth rates in the order of 50 µm/min. The ZMR process performance is substantially impacted by the pre-ribbon physical characteristics. The best and largest recrystallizations were achieved on pre-ribbons grown over powder substrates with smaller particle sizes, which also have lower substrate powder incorporation ratios. Multicrystalline silicon ribbons with crystalline areas as large as 2 × 4 cm<sup>2</sup> were successfully produced. These areas have visible columnar crystal growth with crystal lengths up to 1 cm. The SDS ribbons’ measured resistivity confirmed the high powder content of the resulting material. The ability to produce solar cells on SDS multicrystalline silicon ribbons was demonstrated.
first_indexed 2024-03-11T06:11:22Z
format Article
id doaj.art-74df2d3cac3f4925bec9d575460a6bc0
institution Directory Open Access Journal
issn 2075-4701
language English
last_indexed 2024-03-11T06:11:22Z
publishDate 2023-02-01
publisher MDPI AG
record_format Article
series Metals
spelling doaj.art-74df2d3cac3f4925bec9d575460a6bc02023-11-17T12:37:57ZengMDPI AGMetals2075-47012023-02-0113345210.3390/met13030452Optical Recrystallization of Nanocrystalline Silicon RibbonsFilipe Serra0Ivo Costa1José A. Silva2João M. Serra3Instituto Dom Luiz, Faculdade de Ciências, Universidade de Lisboa, 1749-016 Lisboa, PortugalInstituto Dom Luiz, Faculdade de Ciências, Universidade de Lisboa, 1749-016 Lisboa, PortugalInstituto Dom Luiz, Faculdade de Ciências, Universidade de Lisboa, 1749-016 Lisboa, PortugalInstituto Dom Luiz, Faculdade de Ciências, Universidade de Lisboa, 1749-016 Lisboa, PortugalThe Silicon on Dust Substrate (SDS) is a gas-to-wafer process that produces multicrystalline silicon ribbons directly from gaseous feedstock (silane), avoiding the standard industry steps of polysilicon deposition, crystal growth, and wafering. The SDS technique consists of three main steps: (i) micrometric-sized silicon powder production by grinding silicon chunks; (ii) chemical vapor deposition (CVD) of silicon over this silicon powder substrate; and (iii) zone-melting recrystallization (ZMR) of the nanocrystalline pre-ribbon obtained in the CVD step. Several samples were produced by this technique. During CVD, mechanically self-sustained nanocrystalline pre-ribbons were grown over silicon powder substrates, with growth rates in the order of 50 µm/min. The ZMR process performance is substantially impacted by the pre-ribbon physical characteristics. The best and largest recrystallizations were achieved on pre-ribbons grown over powder substrates with smaller particle sizes, which also have lower substrate powder incorporation ratios. Multicrystalline silicon ribbons with crystalline areas as large as 2 × 4 cm<sup>2</sup> were successfully produced. These areas have visible columnar crystal growth with crystal lengths up to 1 cm. The SDS ribbons’ measured resistivity confirmed the high powder content of the resulting material. The ability to produce solar cells on SDS multicrystalline silicon ribbons was demonstrated.https://www.mdpi.com/2075-4701/13/3/452photovoltaicsilicon powdersilicon feedstockmetallurgysilicon ribbonschemical vapor deposition
spellingShingle Filipe Serra
Ivo Costa
José A. Silva
João M. Serra
Optical Recrystallization of Nanocrystalline Silicon Ribbons
Metals
photovoltaic
silicon powder
silicon feedstock
metallurgy
silicon ribbons
chemical vapor deposition
title Optical Recrystallization of Nanocrystalline Silicon Ribbons
title_full Optical Recrystallization of Nanocrystalline Silicon Ribbons
title_fullStr Optical Recrystallization of Nanocrystalline Silicon Ribbons
title_full_unstemmed Optical Recrystallization of Nanocrystalline Silicon Ribbons
title_short Optical Recrystallization of Nanocrystalline Silicon Ribbons
title_sort optical recrystallization of nanocrystalline silicon ribbons
topic photovoltaic
silicon powder
silicon feedstock
metallurgy
silicon ribbons
chemical vapor deposition
url https://www.mdpi.com/2075-4701/13/3/452
work_keys_str_mv AT filipeserra opticalrecrystallizationofnanocrystallinesiliconribbons
AT ivocosta opticalrecrystallizationofnanocrystallinesiliconribbons
AT joseasilva opticalrecrystallizationofnanocrystallinesiliconribbons
AT joaomserra opticalrecrystallizationofnanocrystallinesiliconribbons