A review of atomic layer deposition modelling and simulation methodologies: Density functional theory and molecular dynamics

The use of computational modelling and simulation methodologies has grown in recent years as researchers try to understand the atomic layer deposition (ALD) process and create new microstructures and nanostructures. This review article explains and simplifies two simulation methodologies, molecular...

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Bibliographic Details
Main Authors: Sibanda David, Oyinbo Sunday Temitope, Jen Tien-Chien
Format: Article
Language:English
Published: De Gruyter 2022-03-01
Series:Nanotechnology Reviews
Subjects:
Online Access:https://doi.org/10.1515/ntrev-2022-0084

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