The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique
Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, R...
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author | Katarzyna Jurek Robert Szczesny Marek Trzcinski Arkadiusz Ciesielski Jolanta Borysiuk Lukasz Skowronski |
author_facet | Katarzyna Jurek Robert Szczesny Marek Trzcinski Arkadiusz Ciesielski Jolanta Borysiuk Lukasz Skowronski |
author_sort | Katarzyna Jurek |
collection | DOAJ |
description | Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, transmission electron microscopy, and spectroscopic ellipsometry. The applied experimental techniques allowed us to characterize the phase composition and the phase transformation of the fabricated TiO<sub>2</sub> coatings. The films produced at room temperature are amorphous but after annealing consist of anatase crystallites. The layers fabricated at 227 °C contain both anatase and rutile phases. In this case the anatase crystallites are accumulated near the substrate interface whilst the rutile crystallites were formed closer to the surface of the TiO<sub>2</sub> film. It should be emphasized that these two phases of TiO<sub>2</sub> are distinctly separated from each other. |
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language | English |
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spelling | doaj.art-7569a2bef437492898c8c823da5dad762023-11-22T16:28:32ZengMDPI AGMaterials1996-19442021-10-011419586310.3390/ma14195863The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM TechniqueKatarzyna Jurek0Robert Szczesny1Marek Trzcinski2Arkadiusz Ciesielski3Jolanta Borysiuk4Lukasz Skowronski5Deparrment of General and Inorganic Chemistry, Faculty of Chemical Technology and Engineering, Bydgoszcz University of Science and Technology, Seminaryjna 3, 85-326 Bydgoszcz, PolandDepartment of Analytical Chemistry and Applied Spectroscopy, Faculty of Chemistry, Nicolaus Copernicus University in Torun, Gagarina 7, 87-100 Torun, PolandInstitute of Mathematics and Physics, Faculty of Chemical Technology and Engineering, Bydgoszcz University of Science and Technology, Kaliskiego 7, 85-796 Bydgoszcz, PolandDivision of Solid State Physics, Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Pasteura 5, 02−093 Warsaw, PolandDivision of Solid State Physics, Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Pasteura 5, 02−093 Warsaw, PolandInstitute of Mathematics and Physics, Faculty of Chemical Technology and Engineering, Bydgoszcz University of Science and Technology, Kaliskiego 7, 85-796 Bydgoszcz, PolandTitanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, transmission electron microscopy, and spectroscopic ellipsometry. The applied experimental techniques allowed us to characterize the phase composition and the phase transformation of the fabricated TiO<sub>2</sub> coatings. The films produced at room temperature are amorphous but after annealing consist of anatase crystallites. The layers fabricated at 227 °C contain both anatase and rutile phases. In this case the anatase crystallites are accumulated near the substrate interface whilst the rutile crystallites were formed closer to the surface of the TiO<sub>2</sub> film. It should be emphasized that these two phases of TiO<sub>2</sub> are distinctly separated from each other.https://www.mdpi.com/1996-1944/14/19/5863titanium dioxidee-BEAMphase transformationmicrostructureoptical constantsannealing |
spellingShingle | Katarzyna Jurek Robert Szczesny Marek Trzcinski Arkadiusz Ciesielski Jolanta Borysiuk Lukasz Skowronski The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique Materials titanium dioxide e-BEAM phase transformation microstructure optical constants annealing |
title | The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique |
title_full | The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique |
title_fullStr | The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique |
title_full_unstemmed | The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique |
title_short | The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique |
title_sort | influence of annealing on the optical properties and microstructure recrystallization of the tio sub 2 sub layers produced by means of the e beam technique |
topic | titanium dioxide e-BEAM phase transformation microstructure optical constants annealing |
url | https://www.mdpi.com/1996-1944/14/19/5863 |
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