The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique

The Influence of Annealing on the Optical Properties and Microstructure Recrystallization of the TiO<sub>2</sub> Layers Produced by Means of the E-BEAM Technique

Titanium dioxide films, about 200 nm in thickness, were deposited using the e-BEAM technique at room temperature and at 227 °C (500K) and then annealed in UHV conditions (as well as in the presence of oxygen (at 850 °C). The fabricated dielectric films were examined using X-ray powder diffraction, R...

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Bibliographic Details
Main Authors: Katarzyna Jurek, Robert Szczesny, Marek Trzcinski, Arkadiusz Ciesielski, Jolanta Borysiuk, Lukasz Skowronski
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Materials
Subjects:
titanium dioxide
e-BEAM
phase transformation
microstructure
optical constants
annealing
Online Access:https://www.mdpi.com/1996-1944/14/19/5863

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