X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films
Titanium nitride thin films were grown on Si(001) and fused silica substrates by radio frequency reactive magnetron sputtering. Post-growth annealing of the films was performed at different temperatures from 300 °C to 700 °C in nitrogen ambient. Films annealed at temperatures above 300 °C exhibit hi...
| Главные авторы: | , , , |
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| Формат: | Статья |
| Язык: | English |
| Опубликовано: |
MDPI AG
2021-02-01
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| Серии: | Crystals |
| Предметы: | |
| Online-ссылка: | https://www.mdpi.com/2073-4352/11/3/239 |