Effects of molecular diffusion length on area-selective growth of organic patterns
Oganic devices have gained much progress in the past decades, as a promising candidate for flexible/wearable electronics. However, the realization of organic microelectronic systems for wide applications is still difficult, due to the incompatibility of organic semiconductors (OSCs) with the convent...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2022-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ac5954 |
| _version_ | 1797746607061467136 |
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| author | Yue Jiang Yichen Cai Jianping Li Naibo Chen Laigui Hu Wenchong Wang Qing-Miao Nie Bo Yan |
| author_facet | Yue Jiang Yichen Cai Jianping Li Naibo Chen Laigui Hu Wenchong Wang Qing-Miao Nie Bo Yan |
| author_sort | Yue Jiang |
| collection | DOAJ |
| description | Oganic devices have gained much progress in the past decades, as a promising candidate for flexible/wearable electronics. However, the realization of organic microelectronic systems for wide applications is still difficult, due to the incompatibility of organic semiconductors (OSCs) with the conventional top-down lithography techniques for inorganics. To solve this challenge, bottom-up lithography-compatible methods have been developed for organic device arrays, i.e., template-directed growth or area-selective growth (ASG). Unfortunately, the physics on the dynamic process of the ASG method for molecular semiconductors is still not well understood. In order to explore this issue, the growth of particles on prepatterned surfaces under different diffusion lengths ( L _d ) was simulated in a microscopic point of view by using kinetic Monte Carlo method. Simulation results show that ASG of the particles is strongly related to the L _d of the particles, periodicity and size of prepatterned surfaces. It is notable that such simulated results were found to fit well with those of our experiments, which can be favorable for improving the ASG method for patterning functional molecules. |
| first_indexed | 2024-03-12T15:39:16Z |
| format | Article |
| id | doaj.art-764200410c3f4328a7f9ba8bbe8bd9f2 |
| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:39:16Z |
| publishDate | 2022-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-764200410c3f4328a7f9ba8bbe8bd9f22023-08-09T16:02:49ZengIOP PublishingMaterials Research Express2053-15912022-01-019303510110.1088/2053-1591/ac5954Effects of molecular diffusion length on area-selective growth of organic patternsYue Jiang0Yichen Cai1Jianping Li2Naibo Chen3Laigui Hu4Wenchong Wang5Qing-Miao Nie6https://orcid.org/0000-0001-7146-0555Bo Yan7https://orcid.org/0000-0002-7885-8109Department of Applied Physics, Zhejiang University of Technology , 288, Liuhe Road,Hangzhou, 310023, People’s Republic of ChinaSchool of Information Science and Technology, Fudan University , Shanghai 200433, People’s Republic of ChinaSchool of Information Science and Technology, Fudan University , Shanghai 200433, People’s Republic of ChinaDepartment of Applied Physics, Zhejiang University of Technology , 288, Liuhe Road,Hangzhou, 310023, People’s Republic of ChinaSchool of Information Science and Technology, Fudan University , Shanghai 200433, People’s Republic of ChinaPhysikalisches Institut and Center for Nanotechnology, Universität3 Physikalisches Institut and Center for Nanotechnology , Universität Münster, Wilhelm-Klemm-Straße 10, 48149 Münster, GermanyDepartment of Applied Physics, Zhejiang University of Technology , 288, Liuhe Road,Hangzhou, 310023, People’s Republic of ChinaDepartment of Applied Physics, Zhejiang University of Technology , 288, Liuhe Road,Hangzhou, 310023, People’s Republic of ChinaOganic devices have gained much progress in the past decades, as a promising candidate for flexible/wearable electronics. However, the realization of organic microelectronic systems for wide applications is still difficult, due to the incompatibility of organic semiconductors (OSCs) with the conventional top-down lithography techniques for inorganics. To solve this challenge, bottom-up lithography-compatible methods have been developed for organic device arrays, i.e., template-directed growth or area-selective growth (ASG). Unfortunately, the physics on the dynamic process of the ASG method for molecular semiconductors is still not well understood. In order to explore this issue, the growth of particles on prepatterned surfaces under different diffusion lengths ( L _d ) was simulated in a microscopic point of view by using kinetic Monte Carlo method. Simulation results show that ASG of the particles is strongly related to the L _d of the particles, periodicity and size of prepatterned surfaces. It is notable that such simulated results were found to fit well with those of our experiments, which can be favorable for improving the ASG method for patterning functional molecules.https://doi.org/10.1088/2053-1591/ac5954kinetic Monte Carloarea-selective growthdiffusion length |
| spellingShingle | Yue Jiang Yichen Cai Jianping Li Naibo Chen Laigui Hu Wenchong Wang Qing-Miao Nie Bo Yan Effects of molecular diffusion length on area-selective growth of organic patterns Materials Research Express kinetic Monte Carlo area-selective growth diffusion length |
| title | Effects of molecular diffusion length on area-selective growth of organic patterns |
| title_full | Effects of molecular diffusion length on area-selective growth of organic patterns |
| title_fullStr | Effects of molecular diffusion length on area-selective growth of organic patterns |
| title_full_unstemmed | Effects of molecular diffusion length on area-selective growth of organic patterns |
| title_short | Effects of molecular diffusion length on area-selective growth of organic patterns |
| title_sort | effects of molecular diffusion length on area selective growth of organic patterns |
| topic | kinetic Monte Carlo area-selective growth diffusion length |
| url | https://doi.org/10.1088/2053-1591/ac5954 |
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