Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification

This paper reports the relationship between oxygen concentration and dislocation multiplication in silicon crystals during directional solidification using numerical analysis. Based on the Alexander–Haasen–Sumino model, this analysis involved oxygen diffusion from the bulk to dis...

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Main Authors: Tomoro Ide, Hirofumi Harada, Yoshiji Miyamura, Masato Imai, Satoshi Nakano, Koichi Kakimoto
Format: Article
Language:English
Published: MDPI AG 2018-06-01
Series:Crystals
Subjects:
Online Access:http://www.mdpi.com/2073-4352/8/6/244
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author Tomoro Ide
Hirofumi Harada
Yoshiji Miyamura
Masato Imai
Satoshi Nakano
Koichi Kakimoto
author_facet Tomoro Ide
Hirofumi Harada
Yoshiji Miyamura
Masato Imai
Satoshi Nakano
Koichi Kakimoto
author_sort Tomoro Ide
collection DOAJ
description This paper reports the relationship between oxygen concentration and dislocation multiplication in silicon crystals during directional solidification using numerical analysis. Based on the Alexander–Haasen–Sumino model, this analysis involved oxygen diffusion from the bulk to dislocation cores during crystal growth and annealing processes in a furnace. The results showed that the dislocation density mainly increased during cooling process, rather than crystal growth, when the effect of oxygen diffusion to dislocation cores was ignored. On the contrary, the dislocation density increased during both crystal growth and cooling processes when the effect of interstitial oxygen diffusion was considered. At a dislocation density larger than 1.0 × 105 cm−2, the interstitial oxygen concentration in bulk decreased due to the diffusion process, if interstitial oxygen atoms were between dislocations, whereas the concentration at dislocation cores increases.
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spelling doaj.art-7757d49425c24a40b5f3ca6637677a7c2022-12-22T04:04:05ZengMDPI AGCrystals2073-43522018-06-018624410.3390/cryst8060244cryst8060244Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional SolidificationTomoro Ide0Hirofumi Harada1Yoshiji Miyamura2Masato Imai3Satoshi Nakano4Koichi Kakimoto5Department of Aeronautics and Astronautics, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, JapanResearch Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, JapanResearch Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, JapanFaculty of Engineering, University of Miyazaki, Gakuen-kibanadai-nishi-1-1, Miyazaki 889-212, JapanResearch Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, JapanDepartment of Aeronautics and Astronautics, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, JapanThis paper reports the relationship between oxygen concentration and dislocation multiplication in silicon crystals during directional solidification using numerical analysis. Based on the Alexander–Haasen–Sumino model, this analysis involved oxygen diffusion from the bulk to dislocation cores during crystal growth and annealing processes in a furnace. The results showed that the dislocation density mainly increased during cooling process, rather than crystal growth, when the effect of oxygen diffusion to dislocation cores was ignored. On the contrary, the dislocation density increased during both crystal growth and cooling processes when the effect of interstitial oxygen diffusion was considered. At a dislocation density larger than 1.0 × 105 cm−2, the interstitial oxygen concentration in bulk decreased due to the diffusion process, if interstitial oxygen atoms were between dislocations, whereas the concentration at dislocation cores increases.http://www.mdpi.com/2073-4352/8/6/244directional solidification methodcrystal growth from the meltsemiconducting silicondefects
spellingShingle Tomoro Ide
Hirofumi Harada
Yoshiji Miyamura
Masato Imai
Satoshi Nakano
Koichi Kakimoto
Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
Crystals
directional solidification method
crystal growth from the melt
semiconducting silicon
defects
title Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
title_full Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
title_fullStr Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
title_full_unstemmed Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
title_short Relationship between Dislocation Density and Oxygen Concentration in Silicon Crystals during Directional Solidification
title_sort relationship between dislocation density and oxygen concentration in silicon crystals during directional solidification
topic directional solidification method
crystal growth from the melt
semiconducting silicon
defects
url http://www.mdpi.com/2073-4352/8/6/244
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