Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications

In this paper, we have investigated the nonlinear optical response and theoretical efficiency of CH3NH3PbI3−xClx thin films from the optical transmission and reflection measurements. The dispersion of the complex refractive index is evaluated using the Wemple–DiDomenico single oscillator model. The...

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Main Authors: A. M. M. Tanveer Karim, M. K. R. Khan, M. N. H. Liton, M. Kamruzzaman, M. S. Hossain, Shengmei Chen
Format: Article
Language:English
Published: AIP Publishing LLC 2022-06-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0086386
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author A. M. M. Tanveer Karim
M. K. R. Khan
M. N. H. Liton
M. Kamruzzaman
M. S. Hossain
Shengmei Chen
author_facet A. M. M. Tanveer Karim
M. K. R. Khan
M. N. H. Liton
M. Kamruzzaman
M. S. Hossain
Shengmei Chen
author_sort A. M. M. Tanveer Karim
collection DOAJ
description In this paper, we have investigated the nonlinear optical response and theoretical efficiency of CH3NH3PbI3−xClx thin films from the optical transmission and reflection measurements. The dispersion of the complex refractive index is evaluated using the Wemple–DiDomenico single oscillator model. The oscillator energy (E0) of CH3NH3PbI3−xClx follows by an empirical relationship with optical bandgap (Eg) as E0 ≈ 2.41 Eg for chemical dip coating, spray, and E0 ≈ 1.63 Eg for dipping deposited samples, respectively. The long wavelength refractive index, average oscillator wavelength, and oscillator strength are also determined using the Sellmeier oscillator equation. The estimated third-order nonlinear optical susceptibility is found to be the order of 10−12 esu. The incident photon and charge carrier interaction in CH3NH3PbI3−xClx is studied from the dielectric response of the samples. The charge carrier excitation is found higher at lower wavelength and experienced bulk excitation in volume while surface excitation on the surface region. The optical conductivity of CH3NH3PbI3−xClx is notably high, which leads to an increase in carrier transfer through the extrinsic halide perovskite material expedient for higher conversion efficiency. The highest theoretical efficiency of CH3NH3PbI3−xClx is estimated to be 17.4%, which is in excellent agreement with the experimental report. From photosensitivity study, it is confirmed that CH3NH3PbI3−xClx films are highly photosensitive. All these results comprehend that CH3NH3PbI3−xClx is a potential candidate for photonic applications.
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spelling doaj.art-78bce914e01047f2adb09fb1203ddf6e2022-12-22T02:43:03ZengAIP Publishing LLCAIP Advances2158-32262022-06-01126065126065126-1610.1063/5.0086386Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applicationsA. M. M. Tanveer Karim0M. K. R. Khan1M. N. H. Liton2M. Kamruzzaman3M. S. Hossain4Shengmei Chen5Department of Physics, Rajshahi University of Engineering and Technology, Rajshahi 6204, BangladeshDepartment of Physics, University of Rajshahi, Rajshahi 6205, BangladeshDepartment of Physics, Begum Rokeya University, Rangpur 5400, BangladeshDepartment of Physics, Begum Rokeya University, Rangpur 5400, BangladeshDepartment of Physics, Rajshahi University of Engineering and Technology, Rajshahi 6204, BangladeshDepartment of Materials and Science Engineering, City University of Hong Kong, Hong Kong, ChinaIn this paper, we have investigated the nonlinear optical response and theoretical efficiency of CH3NH3PbI3−xClx thin films from the optical transmission and reflection measurements. The dispersion of the complex refractive index is evaluated using the Wemple–DiDomenico single oscillator model. The oscillator energy (E0) of CH3NH3PbI3−xClx follows by an empirical relationship with optical bandgap (Eg) as E0 ≈ 2.41 Eg for chemical dip coating, spray, and E0 ≈ 1.63 Eg for dipping deposited samples, respectively. The long wavelength refractive index, average oscillator wavelength, and oscillator strength are also determined using the Sellmeier oscillator equation. The estimated third-order nonlinear optical susceptibility is found to be the order of 10−12 esu. The incident photon and charge carrier interaction in CH3NH3PbI3−xClx is studied from the dielectric response of the samples. The charge carrier excitation is found higher at lower wavelength and experienced bulk excitation in volume while surface excitation on the surface region. The optical conductivity of CH3NH3PbI3−xClx is notably high, which leads to an increase in carrier transfer through the extrinsic halide perovskite material expedient for higher conversion efficiency. The highest theoretical efficiency of CH3NH3PbI3−xClx is estimated to be 17.4%, which is in excellent agreement with the experimental report. From photosensitivity study, it is confirmed that CH3NH3PbI3−xClx films are highly photosensitive. All these results comprehend that CH3NH3PbI3−xClx is a potential candidate for photonic applications.http://dx.doi.org/10.1063/5.0086386
spellingShingle A. M. M. Tanveer Karim
M. K. R. Khan
M. N. H. Liton
M. Kamruzzaman
M. S. Hossain
Shengmei Chen
Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
AIP Advances
title Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
title_full Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
title_fullStr Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
title_full_unstemmed Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
title_short Nonlinear optical response, theoretical efficiencies, and high photosensitivity of CH3NH3PbI3−xClx thin films for photonic applications
title_sort nonlinear optical response theoretical efficiencies and high photosensitivity of ch3nh3pbi3 xclx thin films for photonic applications
url http://dx.doi.org/10.1063/5.0086386
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