Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology

In the present study, the authors demonstrate a complementary metal-oxide semiconductor (CMOS) image sensor implemented with on-chip polarisers using 65-nm standard CMOS technology. The polariser is composed of metal wire grids made of metal wires fabricated by the CMOS process. An extinction ratio...

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Main Authors: N. Wakama, D. Okabayashi, T. Noda, K. Sasagawa, T. Tokuda, K. Kakiuchi, J. Ohta
Format: Article
Language:English
Published: Wiley 2013-09-01
Series:The Journal of Engineering
Subjects:
Online Access:http://digital-library.theiet.org/content/journals/10.1049/joe.2013.0033
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author N. Wakama
D. Okabayashi
T. Noda
K. Sasagawa
T. Tokuda
K. Kakiuchi
J. Ohta
author_facet N. Wakama
D. Okabayashi
T. Noda
K. Sasagawa
T. Tokuda
K. Kakiuchi
J. Ohta
author_sort N. Wakama
collection DOAJ
description In the present study, the authors demonstrate a complementary metal-oxide semiconductor (CMOS) image sensor implemented with on-chip polarisers using 65-nm standard CMOS technology. The polariser is composed of metal wire grids made of metal wires fabricated by the CMOS process. An extinction ratio of 18.8 dB was obtained for a single pixel with an on-chip polariser, where the line/space widths have the finest pitch obtainable by 65-nm technology. Electrical crosstalk between pixels is reduced by over 25% using a guard ring structure. Polarisation imaging by the sensor was also performed.
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spelling doaj.art-7b9bbf75b09f43ce8c10f62d095ed2c32022-12-21T22:25:09ZengWileyThe Journal of Engineering2051-33052013-09-0110.1049/joe.2013.0033Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technologyN. WakamaD. OkabayashiT. NodaK. SasagawaT. TokudaK. KakiuchiJ. OhtaIn the present study, the authors demonstrate a complementary metal-oxide semiconductor (CMOS) image sensor implemented with on-chip polarisers using 65-nm standard CMOS technology. The polariser is composed of metal wire grids made of metal wires fabricated by the CMOS process. An extinction ratio of 18.8 dB was obtained for a single pixel with an on-chip polariser, where the line/space widths have the finest pitch obtainable by 65-nm technology. Electrical crosstalk between pixels is reduced by over 25% using a guard ring structure. Polarisation imaging by the sensor was also performed.http://digital-library.theiet.org/content/journals/10.1049/joe.2013.0033CMOS image sensorscomplementary metal-oxide semiconductor image sensorCMOS image sensoron-chip polarisersmetal wire gridsline-space widthselectrical crosstalkguard ring structurepolarisation imagingsize 65 nm
spellingShingle N. Wakama
D. Okabayashi
T. Noda
K. Sasagawa
T. Tokuda
K. Kakiuchi
J. Ohta
Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
The Journal of Engineering
CMOS image sensors
complementary metal-oxide semiconductor image sensor
CMOS image sensor
on-chip polarisers
metal wire grids
line-space widths
electrical crosstalk
guard ring structure
polarisation imaging
size 65 nm
title Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
title_full Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
title_fullStr Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
title_full_unstemmed Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
title_short Polarisation analysing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology
title_sort polarisation analysing complementary metal oxide semiconductor image sensor in 65 nm standard cmos technology
topic CMOS image sensors
complementary metal-oxide semiconductor image sensor
CMOS image sensor
on-chip polarisers
metal wire grids
line-space widths
electrical crosstalk
guard ring structure
polarisation imaging
size 65 nm
url http://digital-library.theiet.org/content/journals/10.1049/joe.2013.0033
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AT dokabayashi polarisationanalysingcomplementarymetaloxidesemiconductorimagesensorin65nmstandardcmostechnology
AT tnoda polarisationanalysingcomplementarymetaloxidesemiconductorimagesensorin65nmstandardcmostechnology
AT ksasagawa polarisationanalysingcomplementarymetaloxidesemiconductorimagesensorin65nmstandardcmostechnology
AT ttokuda polarisationanalysingcomplementarymetaloxidesemiconductorimagesensorin65nmstandardcmostechnology
AT kkakiuchi polarisationanalysingcomplementarymetaloxidesemiconductorimagesensorin65nmstandardcmostechnology
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