Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing

<p>Abstract</p><p>We demonstrate multiple wavelength InGaAs quantum dot lasers using ion implantation induced intermixing. Proton implantation, followed by annealing is used to create differential interdiffusion in the active region of the devices. The characteristics (lasing-spect...

Full description

Bibliographic Details
Main Authors: Buda M, Mokkapati S, Du Sichao, Fu L, Tan HH, Jagadish C
Format: Article
Language:English
Published: SpringerOpen 2007-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://dx.doi.org/10.1007/s11671-007-9097-x
_version_ 1827836595464568832
author Buda M
Mokkapati S
Du Sichao
Fu L
Tan HH
Jagadish C
author_facet Buda M
Mokkapati S
Du Sichao
Fu L
Tan HH
Jagadish C
author_sort Buda M
collection DOAJ
description <p>Abstract</p><p>We demonstrate multiple wavelength InGaAs quantum dot lasers using ion implantation induced intermixing. Proton implantation, followed by annealing is used to create differential interdiffusion in the active region of the devices. The characteristics (lasing-spectra, threshold currents and slope efficiencies) of the multi-wavelength devices are compared to those of as-grown devices and the differences are explained in terms of altered energy level spacing in the annealed quantum dots.</p>
first_indexed 2024-03-12T06:29:03Z
format Article
id doaj.art-7ba2a63c2d3a46598969878f32414a4e
institution Directory Open Access Journal
issn 1931-7573
1556-276X
language English
last_indexed 2024-03-12T06:29:03Z
publishDate 2007-01-01
publisher SpringerOpen
record_format Article
series Nanoscale Research Letters
spelling doaj.art-7ba2a63c2d3a46598969878f32414a4e2023-09-03T01:43:53ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2007-01-01211550553Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced IntermixingBuda MMokkapati SDu SichaoFu LTan HHJagadish C<p>Abstract</p><p>We demonstrate multiple wavelength InGaAs quantum dot lasers using ion implantation induced intermixing. Proton implantation, followed by annealing is used to create differential interdiffusion in the active region of the devices. The characteristics (lasing-spectra, threshold currents and slope efficiencies) of the multi-wavelength devices are compared to those of as-grown devices and the differences are explained in terms of altered energy level spacing in the annealed quantum dots.</p>http://dx.doi.org/10.1007/s11671-007-9097-xQuantum dot lasersIon implantation
spellingShingle Buda M
Mokkapati S
Du Sichao
Fu L
Tan HH
Jagadish C
Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
Nanoscale Research Letters
Quantum dot lasers
Ion implantation
title Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
title_full Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
title_fullStr Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
title_full_unstemmed Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
title_short Multiple Wavelength InGaAs Quantum Dot Lasers Using Ion Implantation Induced Intermixing
title_sort multiple wavelength ingaas quantum dot lasers using ion implantation induced intermixing
topic Quantum dot lasers
Ion implantation
url http://dx.doi.org/10.1007/s11671-007-9097-x
work_keys_str_mv AT budam multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing
AT mokkapatis multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing
AT dusichao multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing
AT ful multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing
AT tanhh multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing
AT jagadishc multiplewavelengthingaasquantumdotlasersusingionimplantationinducedintermixing