Negative-tone molecular glass photoresist for high-resolution electron beam lithography
A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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The Royal Society
2021-03-01
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| Series: | Royal Society Open Science |
| Subjects: | |
| Online Access: | https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.202132 |
| _version_ | 1818363738810482688 |
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| author | Yafei Wang Long Chen Jiating Yu Xudong Guo Shuangqing Wang Guoqiang Yang |
| author_facet | Yafei Wang Long Chen Jiating Yu Xudong Guo Shuangqing Wang Guoqiang Yang |
| author_sort | Yafei Wang |
| collection | DOAJ |
| description | A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm−2 can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography. |
| first_indexed | 2024-12-13T21:53:15Z |
| format | Article |
| id | doaj.art-7d1665b2456d435b83473c69a71a892b |
| institution | Directory Open Access Journal |
| issn | 2054-5703 |
| language | English |
| last_indexed | 2024-12-13T21:53:15Z |
| publishDate | 2021-03-01 |
| publisher | The Royal Society |
| record_format | Article |
| series | Royal Society Open Science |
| spelling | doaj.art-7d1665b2456d435b83473c69a71a892b2022-12-21T23:30:12ZengThe Royal SocietyRoyal Society Open Science2054-57032021-03-018310.1098/rsos.202132202132Negative-tone molecular glass photoresist for high-resolution electron beam lithographyYafei WangLong ChenJiating YuXudong GuoShuangqing WangGuoqiang YangA low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm−2 can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography.https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.202132photoresistmolecular glass photoresistelectron beam lithographyphotolithographynegative-tone photoresist |
| spellingShingle | Yafei Wang Long Chen Jiating Yu Xudong Guo Shuangqing Wang Guoqiang Yang Negative-tone molecular glass photoresist for high-resolution electron beam lithography Royal Society Open Science photoresist molecular glass photoresist electron beam lithography photolithography negative-tone photoresist |
| title | Negative-tone molecular glass photoresist for high-resolution electron beam lithography |
| title_full | Negative-tone molecular glass photoresist for high-resolution electron beam lithography |
| title_fullStr | Negative-tone molecular glass photoresist for high-resolution electron beam lithography |
| title_full_unstemmed | Negative-tone molecular glass photoresist for high-resolution electron beam lithography |
| title_short | Negative-tone molecular glass photoresist for high-resolution electron beam lithography |
| title_sort | negative tone molecular glass photoresist for high resolution electron beam lithography |
| topic | photoresist molecular glass photoresist electron beam lithography photolithography negative-tone photoresist |
| url | https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.202132 |
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