Negative-tone molecular glass photoresist for high-resolution electron beam lithography

Negative-tone molecular glass photoresist for high-resolution electron beam lithography

A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm...

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Bibliographic Details
Main Authors: Yafei Wang, Long Chen, Jiating Yu, Xudong Guo, Shuangqing Wang, Guoqiang Yang
Format: Article
Language:English
Published: The Royal Society 2021-03-01
Series:Royal Society Open Science
Subjects:
photoresist
molecular glass photoresist
electron beam lithography
photolithography
negative-tone photoresist
Online Access:https://royalsocietypublishing.org/doi/pdf/10.1098/rsos.202132

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