Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF<sub>2</sub> on Si(111)

Electron-Beam Radiation Effects in Multilayer Structures Grown with the Periodical Deposition of Si and CaF<sub>2</sub> on Si(111)

The formation of CaSi<sub>2</sub> films on Si(111) with the molecular-beam epitaxy (MBE) of CaF<sub>2</sub> under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi<sub>2</sub> film synthesis assisted by electron-beam irradiation...

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Bibliographic Details
Main Authors: Anatoly V. Dvurechenskii, Aleksey V. Kacyuba, Gennady N. Kamaev, Vladimir A. Volodin, Natalia P. Stepina, Aigul F. Zinovieva, Vladimir A. Zinovyev
Format: Article
Language:English
Published: MDPI AG 2023-05-01
Series:Materials Proceedings
Subjects:
crystal structure
nanostructures
electron-beam radiation
molecular-beam epitaxy
calcium compounds
silicon
Online Access:https://www.mdpi.com/2673-4605/14/1/68
Description
Summary:The formation of CaSi<sub>2</sub> films on Si(111) with the molecular-beam epitaxy (MBE) of CaF<sub>2</sub> under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi<sub>2</sub> film synthesis assisted by electron-beam irradiation was developed. We combined two approaches to reduce the film roughness: the post-growth electron irradiation and codeposition of additional Si during CaF<sub>2</sub> growth. The application of the solid-phase epitaxy technique at the initial stage of film growth allowed for us to reduce surface roughness down to 1–2 nm.
ISSN:2673-4605

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