Preparation and properties of Nanostructure Zinc Oxide Thin Films

Zinc Oxide (ZnO) is probably the most typical II-VI semiconductor, which exhibits a wide range of nanostructures. In this paper, polycrystalline ZnO thin films were prepared by chemical spray pyrolysis technique, the films were deposited onto glass substrate at 400 °C by using aqueous zinc chloride...

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Main Author: Nada M. Saeed
Format: Article
Language:English
Published: University of Baghdad 2009-12-01
Series:Iraqi Journal of Physics
Subjects:
Online Access:https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/919
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author Nada M. Saeed
author_facet Nada M. Saeed
author_sort Nada M. Saeed
collection DOAJ
description Zinc Oxide (ZnO) is probably the most typical II-VI semiconductor, which exhibits a wide range of nanostructures. In this paper, polycrystalline ZnO thin films were prepared by chemical spray pyrolysis technique, the films were deposited onto glass substrate at 400 °C by using aqueous zinc chloride as a spray solution of molar concentration of 0.1 M/L. The crystallographic structure of the prepared film was analyzed using X-ray diffraction; the result shows that the film was polycrystalline, the grain size which was calculated at (002) was 27.9 nm. The Hall measurement of the film studied from the electrical measurements show that the film was n-type. The optical properties of the film were studied using measurements from VISUV spectrophotometer at wavelength range (300-1100) nm; the optical characterization shows that the films have an average transmittance 55% in the VIS regions. The refractive index was calculated as a function of the photon energy, also the calculated optical energy gap was 3.3 eV and 3.1 eV for direct and indirect allowed transition respectively.
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spelling doaj.art-7dc5152daca042bbbb570a898b26030a2023-03-14T05:50:09ZengUniversity of BaghdadIraqi Journal of Physics2070-40032664-55482009-12-0178Preparation and properties of Nanostructure Zinc Oxide Thin FilmsNada M. Saeed0Department of Physics, College of Science, University of Baghdad Zinc Oxide (ZnO) is probably the most typical II-VI semiconductor, which exhibits a wide range of nanostructures. In this paper, polycrystalline ZnO thin films were prepared by chemical spray pyrolysis technique, the films were deposited onto glass substrate at 400 °C by using aqueous zinc chloride as a spray solution of molar concentration of 0.1 M/L. The crystallographic structure of the prepared film was analyzed using X-ray diffraction; the result shows that the film was polycrystalline, the grain size which was calculated at (002) was 27.9 nm. The Hall measurement of the film studied from the electrical measurements show that the film was n-type. The optical properties of the film were studied using measurements from VISUV spectrophotometer at wavelength range (300-1100) nm; the optical characterization shows that the films have an average transmittance 55% in the VIS regions. The refractive index was calculated as a function of the photon energy, also the calculated optical energy gap was 3.3 eV and 3.1 eV for direct and indirect allowed transition respectively. https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/919Zinc oxide Spray pyrolysis
spellingShingle Nada M. Saeed
Preparation and properties of Nanostructure Zinc Oxide Thin Films
Iraqi Journal of Physics
Zinc oxide Spray pyrolysis
title Preparation and properties of Nanostructure Zinc Oxide Thin Films
title_full Preparation and properties of Nanostructure Zinc Oxide Thin Films
title_fullStr Preparation and properties of Nanostructure Zinc Oxide Thin Films
title_full_unstemmed Preparation and properties of Nanostructure Zinc Oxide Thin Films
title_short Preparation and properties of Nanostructure Zinc Oxide Thin Films
title_sort preparation and properties of nanostructure zinc oxide thin films
topic Zinc oxide Spray pyrolysis
url https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/919
work_keys_str_mv AT nadamsaeed preparationandpropertiesofnanostructurezincoxidethinfilms