Properties of CrSi<sub>2</sub> Layers Obtained by Rapid Heat Treatment of Cr Film on Silicon

Properties of CrSi<sub>2</sub> Layers Obtained by Rapid Heat Treatment of Cr Film on Silicon

The changes in the morphology and the electrophysical properties of the Cr/n-Si (111) structure depending on the rapid thermal treatment were considered in this study. The chromium films of about 30 nm thickness were deposited via magnetron sputtering. The rapid thermal treatment was performed by th...

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Bibliographic Details
Main Authors: Tatyana Kuznetsova, Vasilina Lapitskaya, Jaroslav Solovjov, Sergei Chizhik, Vladimir Pilipenko, Sergei Aizikovich
Format: Article
Language:English
Published: MDPI AG 2021-06-01
Series:Nanomaterials
Subjects:
thin films
chromium
chromium disilicide
silicon substrate
rapid thermal treatment
roughness
Online Access:https://www.mdpi.com/2079-4991/11/7/1734

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