Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions

In this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surfac...

Full description

Bibliographic Details
Main Authors: Yit Lung Khung, Siti Hawa Ngalim, Andrea Scaccabarozzi, Dario Narducci
Format: Article
Language:English
Published: Beilstein-Institut 2015-01-01
Series:Beilstein Journal of Nanotechnology
Subjects:
Online Access:https://doi.org/10.3762/bjnano.6.3
_version_ 1819260057605373952
author Yit Lung Khung
Siti Hawa Ngalim
Andrea Scaccabarozzi
Dario Narducci
author_facet Yit Lung Khung
Siti Hawa Ngalim
Andrea Scaccabarozzi
Dario Narducci
author_sort Yit Lung Khung
collection DOAJ
description In this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surface coupling is biased towards the formation of Si–O–C linkages instead of Si–C linkages, thus indirectly supporting the kinetic model of hydrogen abstraction from the Si–H surface (Khung, Y. L. et al. Chem. – Eur. J. 2014, 20, 15151–15158). To further examine the probability of this kinetic model we compare the results from reactions with bifunctional alkynes carried out under thermal treatment (<130 °C) and under UV irradiation, respectively. X-ray photoelectron spectroscopy and contact angle measurements showed that under thermal conditions, the Si–H surface predominately reacts to form Si–O–C bonds from ethynylbenzyl alcohol solution while the UV photochemical route ensures that the alcohol-based alkyne may also form Si–C bonds, thus producing a monolayer of mixed linkages. The results suggested the importance of surface radicals as well as the type of terminal group as being essential towards directing the nature of surface linkage.
first_indexed 2024-12-23T19:19:51Z
format Article
id doaj.art-7f01fde4ee29430f9c77537dcbb2e0a5
institution Directory Open Access Journal
issn 2190-4286
language English
last_indexed 2024-12-23T19:19:51Z
publishDate 2015-01-01
publisher Beilstein-Institut
record_format Article
series Beilstein Journal of Nanotechnology
spelling doaj.art-7f01fde4ee29430f9c77537dcbb2e0a52022-12-21T17:34:12ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862015-01-0161192610.3762/bjnano.6.32190-4286-6-3Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditionsYit Lung Khung0Siti Hawa Ngalim1Andrea Scaccabarozzi2Dario Narducci3University of Milan-Bicocca, Department of Materials Science, Via R. Cozzi 53, I-20125 Milan, ItalyRegenerative Medicine Cluster, Advanced Medical and Dental Institute (AMDI), Universiti Sains Malaysia, Penang, MalaysiaUniversity of Milan-Bicocca, Department of Materials Science, Via R. Cozzi 53, I-20125 Milan, ItalyUniversity of Milan-Bicocca, Department of Materials Science, Via R. Cozzi 53, I-20125 Milan, ItalyIn this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surface coupling is biased towards the formation of Si–O–C linkages instead of Si–C linkages, thus indirectly supporting the kinetic model of hydrogen abstraction from the Si–H surface (Khung, Y. L. et al. Chem. – Eur. J. 2014, 20, 15151–15158). To further examine the probability of this kinetic model we compare the results from reactions with bifunctional alkynes carried out under thermal treatment (<130 °C) and under UV irradiation, respectively. X-ray photoelectron spectroscopy and contact angle measurements showed that under thermal conditions, the Si–H surface predominately reacts to form Si–O–C bonds from ethynylbenzyl alcohol solution while the UV photochemical route ensures that the alcohol-based alkyne may also form Si–C bonds, thus producing a monolayer of mixed linkages. The results suggested the importance of surface radicals as well as the type of terminal group as being essential towards directing the nature of surface linkage.https://doi.org/10.3762/bjnano.6.3hydrogen abstractionthermal hydrosilylationUV-initated hydrosilylationX-ray photoelectron spectroscopy
spellingShingle Yit Lung Khung
Siti Hawa Ngalim
Andrea Scaccabarozzi
Dario Narducci
Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
Beilstein Journal of Nanotechnology
hydrogen abstraction
thermal hydrosilylation
UV-initated hydrosilylation
X-ray photoelectron spectroscopy
title Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_full Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_fullStr Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_full_unstemmed Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_short Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_sort formation of stable si o c submonolayers on hydrogen terminated silicon 111 under low temperature conditions
topic hydrogen abstraction
thermal hydrosilylation
UV-initated hydrosilylation
X-ray photoelectron spectroscopy
url https://doi.org/10.3762/bjnano.6.3
work_keys_str_mv AT yitlungkhung formationofstablesiocsubmonolayersonhydrogenterminatedsilicon111underlowtemperatureconditions
AT sitihawangalim formationofstablesiocsubmonolayersonhydrogenterminatedsilicon111underlowtemperatureconditions
AT andreascaccabarozzi formationofstablesiocsubmonolayersonhydrogenterminatedsilicon111underlowtemperatureconditions
AT darionarducci formationofstablesiocsubmonolayersonhydrogenterminatedsilicon111underlowtemperatureconditions