Thin Ferromagnetic Films Deposition by Facing Target Sputtering Method
Facing targets sputtering system, constructed specially for ferromagnetic cathode sputtering, was investigated in this study. The currentvoltage (I-V ) characteristics, deposition rate dependence on the discharge power, dependence on the distance between the center axis of targets and substrate, and...
| Autors principals: | , , , |
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| Format: | Article |
| Idioma: | English |
| Publicat: |
Vilnius University Press
2005-01-01
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| Col·lecció: | Nonlinear Analysis |
| Matèries: | |
| Accés en línia: | http://www.zurnalai.vu.lt/nonlinear-analysis/article/view/15134 |