Thin Ferromagnetic Films Deposition by Facing Target Sputtering Method
Facing targets sputtering system, constructed specially for ferromagnetic cathode sputtering, was investigated in this study. The currentvoltage (I-V ) characteristics, deposition rate dependence on the discharge power, dependence on the distance between the center axis of targets and substrate, and...
| Hlavní autoři: | , , , |
|---|---|
| Médium: | Článek |
| Jazyk: | English |
| Vydáno: |
Vilnius University Press
2005-01-01
|
| Edice: | Nonlinear Analysis |
| Témata: | |
| On-line přístup: | http://www.zurnalai.vu.lt/nonlinear-analysis/article/view/15134 |