Thin Ferromagnetic Films Deposition by Facing Target Sputtering Method
Facing targets sputtering system, constructed specially for ferromagnetic cathode sputtering, was investigated in this study. The currentvoltage (I-V ) characteristics, deposition rate dependence on the discharge power, dependence on the distance between the center axis of targets and substrate, and...
| Main Authors: | , , , |
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| 格式: | 文件 |
| 语言: | English |
| 出版: |
Vilnius University Press
2005-01-01
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| 丛编: | Nonlinear Analysis |
| 主题: | |
| 在线阅读: | http://www.zurnalai.vu.lt/nonlinear-analysis/article/view/15134 |