Fixation mechanisms of nanoparticles on substrates by electron beam irradiation
For applications such as the fabrication of plasmonic waveguides we developed a patterning technique to fabricate an array of nanoparticles on a substrate using focused electron beams (Noriki, T.; Abe, S.;.Kajikawa, K.; Shimojo, M. Beilstein J. Nanotechnol. 2015, 6, 1010–1015). This technique consis...
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| Format: | Article |
| Language: | English |
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Beilstein-Institut
2017-07-01
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| Series: | Beilstein Journal of Nanotechnology |
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| Online Access: | https://doi.org/10.3762/bjnano.8.153 |
| _version_ | 1818056844814319616 |
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| author | Daichi Morioka Tomohiro Nose Taiki Chikuta Kazutaka Mitsuishi Masayuki Shimojo |
| author_facet | Daichi Morioka Tomohiro Nose Taiki Chikuta Kazutaka Mitsuishi Masayuki Shimojo |
| author_sort | Daichi Morioka |
| collection | DOAJ |
| description | For applications such as the fabrication of plasmonic waveguides we developed a patterning technique to fabricate an array of nanoparticles on a substrate using focused electron beams (Noriki, T.; Abe, S.;.Kajikawa, K.; Shimojo, M. Beilstein J. Nanotechnol. 2015, 6, 1010–1015). This technique consists of three steps: Firstly, nanoparticles are placed over the entire surface of a substrate. Secondly, the nanoparticles are fixed on the substrate by focused electron beam irradiation. The electron beam decomposes the organic molecules located around the particle into amorphous carbon. The amorphous carbon immobilizes the particle on the substrate. Finally, the unfixed nanoparticles are removed. However, in this original technique, the area in which the nanoparticles were fixed was wider than the electron-probe size of a few nanometers. To understand this widening mechanisms, the effects of accelerating voltage, particle size and substrate material are investigated by means of both experiments and simulation. It is demonstrated that the fixing area is greatly affected by the electrons back-scattered by the substrate. The back-scattering leads to an increase in line width and thus reduces the resolution of this patterning technique. |
| first_indexed | 2024-12-10T12:35:18Z |
| format | Article |
| id | doaj.art-7fef59f78a6f44509cc6229e2c5fa012 |
| institution | Directory Open Access Journal |
| issn | 2190-4286 |
| language | English |
| last_indexed | 2024-12-10T12:35:18Z |
| publishDate | 2017-07-01 |
| publisher | Beilstein-Institut |
| record_format | Article |
| series | Beilstein Journal of Nanotechnology |
| spelling | doaj.art-7fef59f78a6f44509cc6229e2c5fa0122022-12-22T01:48:41ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862017-07-01811523152910.3762/bjnano.8.1532190-4286-8-153Fixation mechanisms of nanoparticles on substrates by electron beam irradiationDaichi Morioka0Tomohiro Nose1Taiki Chikuta2Kazutaka Mitsuishi3Masayuki Shimojo4Department of Materials Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo, 135-8548, JapanDepartment of Materials Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo, 135-8548, JapanDepartment of Materials Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo, 135-8548, JapanResearch Center for Advanced Measurement and Characterization, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, 305-0047, JapanDepartment of Materials Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo, 135-8548, JapanFor applications such as the fabrication of plasmonic waveguides we developed a patterning technique to fabricate an array of nanoparticles on a substrate using focused electron beams (Noriki, T.; Abe, S.;.Kajikawa, K.; Shimojo, M. Beilstein J. Nanotechnol. 2015, 6, 1010–1015). This technique consists of three steps: Firstly, nanoparticles are placed over the entire surface of a substrate. Secondly, the nanoparticles are fixed on the substrate by focused electron beam irradiation. The electron beam decomposes the organic molecules located around the particle into amorphous carbon. The amorphous carbon immobilizes the particle on the substrate. Finally, the unfixed nanoparticles are removed. However, in this original technique, the area in which the nanoparticles were fixed was wider than the electron-probe size of a few nanometers. To understand this widening mechanisms, the effects of accelerating voltage, particle size and substrate material are investigated by means of both experiments and simulation. It is demonstrated that the fixing area is greatly affected by the electrons back-scattered by the substrate. The back-scattering leads to an increase in line width and thus reduces the resolution of this patterning technique.https://doi.org/10.3762/bjnano.8.153accelerating voltageelectron beamgoldMonte Carlo simulationnanoparticle array |
| spellingShingle | Daichi Morioka Tomohiro Nose Taiki Chikuta Kazutaka Mitsuishi Masayuki Shimojo Fixation mechanisms of nanoparticles on substrates by electron beam irradiation Beilstein Journal of Nanotechnology accelerating voltage electron beam gold Monte Carlo simulation nanoparticle array |
| title | Fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| title_full | Fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| title_fullStr | Fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| title_full_unstemmed | Fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| title_short | Fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| title_sort | fixation mechanisms of nanoparticles on substrates by electron beam irradiation |
| topic | accelerating voltage electron beam gold Monte Carlo simulation nanoparticle array |
| url | https://doi.org/10.3762/bjnano.8.153 |
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