Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique

In this work, the effect of annealing temperature on the electrical properties are studied of p-Se/ n-Si solar cell, which p-Se are deposit by DC planar magnetron sputtering technique on crystal silicon. The chamber was pumped down to 2×10−5 mbar before admitting the gas in. The gas was Ar. The spu...

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Main Author: Kadhim A. Al-Hamdani
Format: Article
Language:English
Published: University of Baghdad 2010-12-01
Series:Iraqi Journal of Physics
Subjects:
Online Access:https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/835
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author Kadhim A. Al-Hamdani
author_facet Kadhim A. Al-Hamdani
author_sort Kadhim A. Al-Hamdani
collection DOAJ
description In this work, the effect of annealing temperature on the electrical properties are studied of p-Se/ n-Si solar cell, which p-Se are deposit by DC planar magnetron sputtering technique on crystal silicon. The chamber was pumped down to 2×10−5 mbar before admitting the gas in. The gas was Ar. The sputtering pressure varied within the range of 4x10-1 - 8x10-2mbar by adjusting the pumping speed through the opening control of throttle valve. The electrical properties are included the C-V and I-V measurements. From C-V measurements, the Vbi are calculated while from I-V measurements, the efficiency of solar cell is calculated.
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spelling doaj.art-81147aee771b46f18f60aac9669b1ad82023-03-14T05:48:00ZengUniversity of BaghdadIraqi Journal of Physics2070-40032664-55482010-12-01813Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering techniqueKadhim A. Al-Hamdani0Department of Physics, College of Science, University of Baghdad In this work, the effect of annealing temperature on the electrical properties are studied of p-Se/ n-Si solar cell, which p-Se are deposit by DC planar magnetron sputtering technique on crystal silicon. The chamber was pumped down to 2×10−5 mbar before admitting the gas in. The gas was Ar. The sputtering pressure varied within the range of 4x10-1 - 8x10-2mbar by adjusting the pumping speed through the opening control of throttle valve. The electrical properties are included the C-V and I-V measurements. From C-V measurements, the Vbi are calculated while from I-V measurements, the efficiency of solar cell is calculated. https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/835Se/Si heterojunction DC planar magnetron sputtering
spellingShingle Kadhim A. Al-Hamdani
Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
Iraqi Journal of Physics
Se/Si heterojunction DC planar magnetron sputtering
title Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
title_full Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
title_fullStr Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
title_full_unstemmed Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
title_short Current–voltage and capacitance-voltage characteristics of Se/Si heterojunction prepared by DC planar magnetron sputtering technique
title_sort current voltage and capacitance voltage characteristics of se si heterojunction prepared by dc planar magnetron sputtering technique
topic Se/Si heterojunction DC planar magnetron sputtering
url https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/835
work_keys_str_mv AT kadhimaalhamdani currentvoltageandcapacitancevoltagecharacteristicsofsesiheterojunctionpreparedbydcplanarmagnetronsputteringtechnique