Fractal analysis of the surface of indium–tin-oxide
In this study, indium-tin-oxide thin films in different thickness ranges were prepared by electron beam evaporation method on the glass substrate at room temperature. The thicknesses of films were 100, 150 and 250nm. Using fractal analysis, morphological characteristics of surface films thickness in...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Isfahan University of Technology
2012-12-01
|
| Series: | Iranian Journal of Physics Research |
| Subjects: | |
| Online Access: | http://ijpr.iut.ac.ir/browse.php?a_code=A-10-1-589&slc_lang=en&sid=1 |
| _version_ | 1818066992743055360 |
|---|---|
| author | D Raoufi F Hosseinpanahi |
| author_facet | D Raoufi F Hosseinpanahi |
| author_sort | D Raoufi |
| collection | DOAJ |
| description | In this study, indium-tin-oxide thin films in different thickness ranges were prepared by electron beam evaporation method on the glass substrate at room temperature. The thicknesses of films were 100, 150 and 250nm. Using fractal analysis, morphological characteristics of surface films thickness in amorphous state were investigated. The results showed that by increasing thickness, surface roughness (RMS) and lateral correlation length ( x ) were decreased. Also, the roughness exponent a and growth exponent b were determined to be 0.72 ± 0.01 and 0.11, respectively. Based on these results, we understand that the growth films can be described by the combination of the Edwards-Wilkinson equation and Mullins diffusion equation. |
| first_indexed | 2024-12-10T15:16:36Z |
| format | Article |
| id | doaj.art-816b12cd6b814dfaa11d92239dce037c |
| institution | Directory Open Access Journal |
| issn | 1682-6957 |
| language | English |
| last_indexed | 2024-12-10T15:16:36Z |
| publishDate | 2012-12-01 |
| publisher | Isfahan University of Technology |
| record_format | Article |
| series | Iranian Journal of Physics Research |
| spelling | doaj.art-816b12cd6b814dfaa11d92239dce037c2022-12-22T01:43:47ZengIsfahan University of TechnologyIranian Journal of Physics Research1682-69572012-12-01123245251Fractal analysis of the surface of indium–tin-oxideD RaoufiF HosseinpanahiIn this study, indium-tin-oxide thin films in different thickness ranges were prepared by electron beam evaporation method on the glass substrate at room temperature. The thicknesses of films were 100, 150 and 250nm. Using fractal analysis, morphological characteristics of surface films thickness in amorphous state were investigated. The results showed that by increasing thickness, surface roughness (RMS) and lateral correlation length ( x ) were decreased. Also, the roughness exponent a and growth exponent b were determined to be 0.72 ± 0.01 and 0.11, respectively. Based on these results, we understand that the growth films can be described by the combination of the Edwards-Wilkinson equation and Mullins diffusion equation.http://ijpr.iut.ac.ir/browse.php?a_code=A-10-1-589&slc_lang=en&sid=1ITO; thin filmfractal analysismorphology |
| spellingShingle | D Raoufi F Hosseinpanahi Fractal analysis of the surface of indium–tin-oxide Iranian Journal of Physics Research ITO; thin film fractal analysis morphology |
| title | Fractal analysis of the surface of indium–tin-oxide |
| title_full | Fractal analysis of the surface of indium–tin-oxide |
| title_fullStr | Fractal analysis of the surface of indium–tin-oxide |
| title_full_unstemmed | Fractal analysis of the surface of indium–tin-oxide |
| title_short | Fractal analysis of the surface of indium–tin-oxide |
| title_sort | fractal analysis of the surface of indium tin oxide |
| topic | ITO; thin film fractal analysis morphology |
| url | http://ijpr.iut.ac.ir/browse.php?a_code=A-10-1-589&slc_lang=en&sid=1 |
| work_keys_str_mv | AT draoufi fractalanalysisofthesurfaceofindiumtinoxide AT fhosseinpanahi fractalanalysisofthesurfaceofindiumtinoxide |