Toward fast and accurate machine learning interatomic potentials for atomic layer deposition precursors

Toward fast and accurate machine learning interatomic potentials for atomic layer deposition precursors

Under thin film deposition, when used in conjunction with the semiconductor atomic layer deposition (ALD) method, the choice of precursor determines the properties and quality of the thin film. Organometallic precursors such as alkaline earth metals (Sr and Ba) and group 4 transition metals (Zr and...

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Bibliographic Details
Main Authors: Seungpyo Kang, Joonchul Kim, Taehyun Park, Joonghee Won, Chul Baik, Jungim Han, Kyoungmin Min
Format: Article
Language:English
Published: Elsevier 2024-03-01
Series:Materials Today Advances
Subjects:
Organometallic precursors
Machine learning interatomic potential
Moment tensor potential
Ab initio molecular dynamics
Online Access:http://www.sciencedirect.com/science/article/pii/S2590049824000110

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