The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror
The uniformity and consistency of X-ray mirror film materials prepared by experimental methods are difficult to guarantee completely. These factors directly affect the service life of free electron laser devices in addition to its own optical properties. Therefore, the quality of the film material,...
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MDPI AG
2024-02-01
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| Series: | Materials |
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| Online Access: | https://www.mdpi.com/1996-1944/17/5/1026 |
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| author | Tingting Sui Haohui Zhuo Anchun Tang Xin Ju |
| author_facet | Tingting Sui Haohui Zhuo Anchun Tang Xin Ju |
| author_sort | Tingting Sui |
| collection | DOAJ |
| description | The uniformity and consistency of X-ray mirror film materials prepared by experimental methods are difficult to guarantee completely. These factors directly affect the service life of free electron laser devices in addition to its own optical properties. Therefore, the quality of the film material, especially the density, has a critical effect on its application. Boron carbide film and monocrystalline silicon substrate were suitable examples to explore their influence of density on the damage threshold based on Monte Carlo and heat-conduction methods. Through simulation results, it was found that the change in film density could affect the energy deposition depth and damage threshold. When the film density was 2.48 g/cm<sup>3</sup>, it had relatively high damage threshold in all energy ranges. And then the specific incident parameter for practical application was investigated. It was found that the damage mechanism of the B<sub>4</sub>C/Si was the melting of the interface. And the damage threshold was also higher with the film density of 2.48 g/cm<sup>3</sup>. Therefore, it was recommended to maintain the density at this value as far as possible when preparing the film, and to ensure the uniformity and consistency of the film material. |
| first_indexed | 2024-04-25T00:25:36Z |
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| id | doaj.art-827fcea468c44685bfeac1d499589d50 |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-04-25T00:25:36Z |
| publishDate | 2024-02-01 |
| publisher | MDPI AG |
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| series | Materials |
| spelling | doaj.art-827fcea468c44685bfeac1d499589d502024-03-12T16:48:59ZengMDPI AGMaterials1996-19442024-02-01175102610.3390/ma17051026The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray MirrorTingting Sui0Haohui Zhuo1Anchun Tang2Xin Ju3Department of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, ChinaDepartment of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, ChinaDepartment of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, ChinaDepartment of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, ChinaThe uniformity and consistency of X-ray mirror film materials prepared by experimental methods are difficult to guarantee completely. These factors directly affect the service life of free electron laser devices in addition to its own optical properties. Therefore, the quality of the film material, especially the density, has a critical effect on its application. Boron carbide film and monocrystalline silicon substrate were suitable examples to explore their influence of density on the damage threshold based on Monte Carlo and heat-conduction methods. Through simulation results, it was found that the change in film density could affect the energy deposition depth and damage threshold. When the film density was 2.48 g/cm<sup>3</sup>, it had relatively high damage threshold in all energy ranges. And then the specific incident parameter for practical application was investigated. It was found that the damage mechanism of the B<sub>4</sub>C/Si was the melting of the interface. And the damage threshold was also higher with the film density of 2.48 g/cm<sup>3</sup>. Therefore, it was recommended to maintain the density at this value as far as possible when preparing the film, and to ensure the uniformity and consistency of the film material.https://www.mdpi.com/1996-1944/17/5/1026B<sub>4</sub>C filmdensityXFELMonte Carlodamage threshold |
| spellingShingle | Tingting Sui Haohui Zhuo Anchun Tang Xin Ju The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror Materials B<sub>4</sub>C film density XFEL Monte Carlo damage threshold |
| title | The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror |
| title_full | The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror |
| title_fullStr | The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror |
| title_full_unstemmed | The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror |
| title_short | The Influence of B<sub>4</sub>C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror |
| title_sort | influence of b sub 4 sub c film density on damage threshold based on monte carlo method for x ray mirror |
| topic | B<sub>4</sub>C film density XFEL Monte Carlo damage threshold |
| url | https://www.mdpi.com/1996-1944/17/5/1026 |
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