Influence of Oxygen Flow Rate on Channel Width Dependent Electrical Properties of Indium Gallium Zinc Oxide Thin-Film Transistors
The effects of various oxygen flows on indium gallium zinc oxide (IGZO) based thin-film transistors (TFTs) with different channel width sizes have been investigated. The IGZO nano-films exhibited amorphous phase while the bandgap energy and sheet resistance increased with increasing oxygen flow rate...
Main Authors: | Gwomei Wu, Anup K. Sahoo |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-11-01
|
Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/10/12/2357 |
Similar Items
-
Study of the Correlation between the Amorphous Indium-Gallium-Zinc Oxide Film Quality and the Thin-Film Transistor Performance
by: Shiben Hu, et al.
Published: (2021-02-01) -
Critical Effect of Oxygen Pressure in Pulsed Laser Deposition for Room Temperature and High Performance Amorphous In-Ga-Zn-O Thin Film Transistors
by: Yue Zhou, et al.
Published: (2022-12-01) -
Argon and Oxygen Gas Flow Rate Dependency of Sputtering-Based Indium-Gallium-Zinc Oxide Thin-Film Transistors
by: Youngmin Han, et al.
Published: (2023-07-01) -
High Performance Amorphous IGZO Thin-Film Transistor Based on Alumina Ceramic
by: Lei Zhang, et al.
Published: (2019-01-01) -
A Direct n<sup>+</sup>-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors
by: Xinlv Duan, et al.
Published: (2022-04-01)