Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process

In this work, void formation was systematically observed for the glass frit bonding technique as a function of the annealing temperature, annealing time, and annealing ambient. High annealing temperature and long annealing time were adopted to reach the maximum heat flux to avoid voids/bubbles. As d...

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Main Authors: Yifang Liu, Junyu Chen, Jiaxin Jiang, Gaofeng Zheng
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/13/12/2104
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author Yifang Liu
Junyu Chen
Jiaxin Jiang
Gaofeng Zheng
author_facet Yifang Liu
Junyu Chen
Jiaxin Jiang
Gaofeng Zheng
author_sort Yifang Liu
collection DOAJ
description In this work, void formation was systematically observed for the glass frit bonding technique as a function of the annealing temperature, annealing time, and annealing ambient. High annealing temperature and long annealing time were adopted to reach the maximum heat flux to avoid voids/bubbles. As demonstrated in the experiments, the voids appearing during glass frit bonding are related to the quantity of byproducts from the combustion of organic matter. The experimental results indicate that solely in air, under vacuum, or annealed for short time, the combustion products cannot be fully degassed, and voids occur. It was shown that the alternating three-step conditioning process including glass liquid forming in air, bubble removal under vacuum, and void filling-up in air can lead to void-free and uniform wafer bonding. The glass frit bonding samples with lots of voids/bubbles were compared to the ones without any defects.
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spelling doaj.art-8ac092ad70054dab997b08568d1d3a282023-11-24T16:44:14ZengMDPI AGMicromachines2072-666X2022-11-011312210410.3390/mi13122104Void Suppression in Glass Frit Bonding Via Three-Step Annealing ProcessYifang Liu0Junyu Chen1Jiaxin Jiang2Gaofeng Zheng3Department of Instrumental and Electrical Engineering, Xiamen University, Xiamen 361102, ChinaDepartment of Instrumental and Electrical Engineering, Xiamen University, Xiamen 361102, ChinaSchool of Mechanical and Automotive Engineering, Xiamen University of Technology, Xiamen 361024, ChinaDepartment of Instrumental and Electrical Engineering, Xiamen University, Xiamen 361102, ChinaIn this work, void formation was systematically observed for the glass frit bonding technique as a function of the annealing temperature, annealing time, and annealing ambient. High annealing temperature and long annealing time were adopted to reach the maximum heat flux to avoid voids/bubbles. As demonstrated in the experiments, the voids appearing during glass frit bonding are related to the quantity of byproducts from the combustion of organic matter. The experimental results indicate that solely in air, under vacuum, or annealed for short time, the combustion products cannot be fully degassed, and voids occur. It was shown that the alternating three-step conditioning process including glass liquid forming in air, bubble removal under vacuum, and void filling-up in air can lead to void-free and uniform wafer bonding. The glass frit bonding samples with lots of voids/bubbles were compared to the ones without any defects.https://www.mdpi.com/2072-666X/13/12/2104glass fritvoid suppressionannealingparameter optimization
spellingShingle Yifang Liu
Junyu Chen
Jiaxin Jiang
Gaofeng Zheng
Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
Micromachines
glass frit
void suppression
annealing
parameter optimization
title Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
title_full Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
title_fullStr Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
title_full_unstemmed Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
title_short Void Suppression in Glass Frit Bonding Via Three-Step Annealing Process
title_sort void suppression in glass frit bonding via three step annealing process
topic glass frit
void suppression
annealing
parameter optimization
url https://www.mdpi.com/2072-666X/13/12/2104
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AT junyuchen voidsuppressioninglassfritbondingviathreestepannealingprocess
AT jiaxinjiang voidsuppressioninglassfritbondingviathreestepannealingprocess
AT gaofengzheng voidsuppressioninglassfritbondingviathreestepannealingprocess