Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology
This paper presents the design and a new low-cost process for fabrication of a second-order micromechanical filter using UV-LIGA technology. The micromechanical filter consists of two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. A new lumped modeling approach is...
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| Format: | Article |
| Language: | English |
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Iran University of Science and Technology
2012-12-01
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| Series: | Iranian Journal of Electrical and Electronic Engineering |
| Subjects: | |
| Online Access: | http://ijeee.iust.ac.ir/browse.php?a_code=A-10-612-3&slc_lang=en&sid=1 |
| _version_ | 1818962789757091840 |
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| author | A. Bijari S. H. Keshmiri W. Wanburee Ch. Sriphung R. Phatthanakun |
| author_facet | A. Bijari S. H. Keshmiri W. Wanburee Ch. Sriphung R. Phatthanakun |
| author_sort | A. Bijari |
| collection | DOAJ |
| description | This paper presents the design and a new low-cost process for fabrication of a second-order micromechanical filter using UV-LIGA technology. The micromechanical filter consists of two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. A new lumped modeling approach is presented for the bulk-mode ring resonators and filter. The validity of the analytical derivation is investigated using the finite element method by ANSYS software. The new low-cost fabrication process is used to achieve a high aspect ratio of 16 with 3 μm gap spacing. The rigid graphite serves as a low-cost primary substrate and plating base of nickel as structural material. The fabrication process needs only three UV-lithography steps with Mylar masks to fabricate the main structure and pattern the printed circuit board as a secondary substrate. The frequency response of the fabricated filter is characterized as a function of the DC-bias voltage using a fully differential drive and sense interface circuit. The experimental results demonstrates micromechanical filter with center frequency in the vicinity of 10.31 MHz and percent bandwidth less than 0.3% using a DC-bias voltage of 60 V. The detailed fabrication process can be applied as an appropriate low-cost alternative to X-ray LIGA and silicon-based micromechanical filters. |
| first_indexed | 2024-12-20T12:34:55Z |
| format | Article |
| id | doaj.art-8ad54abba527437a86384378a53061c7 |
| institution | Directory Open Access Journal |
| issn | 1735-2827 2383-3890 |
| language | English |
| last_indexed | 2024-12-20T12:34:55Z |
| publishDate | 2012-12-01 |
| publisher | Iran University of Science and Technology |
| record_format | Article |
| series | Iranian Journal of Electrical and Electronic Engineering |
| spelling | doaj.art-8ad54abba527437a86384378a53061c72022-12-21T19:40:38ZengIran University of Science and TechnologyIranian Journal of Electrical and Electronic Engineering1735-28272383-38902012-12-0184280289Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA TechnologyA. Bijari0S. H. Keshmiri1W. Wanburee2Ch. Sriphung3R. Phatthanakun4 Department of Electrical Engineering, Faculty of Engineering, Ferdowsi University of Mashhad (FUM) Department of Electrical Engineering, Faculty of Engineering, Ferdowsi University of Mashhad (FUM) School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology (SUT) Synchrotron Light Research Institution (SLRI) Synchrotron Light Research Institution (SLRI) This paper presents the design and a new low-cost process for fabrication of a second-order micromechanical filter using UV-LIGA technology. The micromechanical filter consists of two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. A new lumped modeling approach is presented for the bulk-mode ring resonators and filter. The validity of the analytical derivation is investigated using the finite element method by ANSYS software. The new low-cost fabrication process is used to achieve a high aspect ratio of 16 with 3 μm gap spacing. The rigid graphite serves as a low-cost primary substrate and plating base of nickel as structural material. The fabrication process needs only three UV-lithography steps with Mylar masks to fabricate the main structure and pattern the printed circuit board as a secondary substrate. The frequency response of the fabricated filter is characterized as a function of the DC-bias voltage using a fully differential drive and sense interface circuit. The experimental results demonstrates micromechanical filter with center frequency in the vicinity of 10.31 MHz and percent bandwidth less than 0.3% using a DC-bias voltage of 60 V. The detailed fabrication process can be applied as an appropriate low-cost alternative to X-ray LIGA and silicon-based micromechanical filters.http://ijeee.iust.ac.ir/browse.php?a_code=A-10-612-3&slc_lang=en&sid=1Micromechanical Ring Filter Nickel Electroplating SU-8 Photoresist UV-LIGA |
| spellingShingle | A. Bijari S. H. Keshmiri W. Wanburee Ch. Sriphung R. Phatthanakun Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology Iranian Journal of Electrical and Electronic Engineering Micromechanical Ring Filter Nickel Electroplating SU-8 Photoresist UV-LIGA |
| title | Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology |
| title_full | Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology |
| title_fullStr | Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology |
| title_full_unstemmed | Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology |
| title_short | Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology |
| title_sort | design and fabrication of a narrow bandwidth micromechanical ring filter using a novel process in uv liga technology |
| topic | Micromechanical Ring Filter Nickel Electroplating SU-8 Photoresist UV-LIGA |
| url | http://ijeee.iust.ac.ir/browse.php?a_code=A-10-612-3&slc_lang=en&sid=1 |
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