Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO<i><sub>x</sub></i> Films at Different Substrate Temperatures

Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO<i><sub>x</sub></i> Films at Different Substrate Temperatures

The promising functional tin oxide (SnO<i><sub>x</sub></i>) has attracted tremendous attention due to its transparent and conductive properties. The stoichiometric composition of SnO<i><sub>x</sub></i> can be described as common n-type SnO<sub>2&...

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Bibliographic Details
Main Authors: Pao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Sin-Liang Ou, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu
Format: Article
Language:English
Published: MDPI AG 2022-08-01
Series:Nanomaterials
Subjects:
tin oxide (SnO<i><sub>x</sub></i>)
plasma-enhanced atomic layer deposition (PEALD)
substrate temperature
Online Access:https://www.mdpi.com/2079-4991/12/16/2859

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