A universal method for depositing patterned materials in situ
Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping.
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2020-10-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-020-19210-0 |
| Summary: | Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. |
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| ISSN: | 2041-1723 |