A universal method for depositing patterned materials in situ
Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping.
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2020-10-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-020-19210-0 |
| _version_ | 1818919606761291776 |
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| author | Yifan Chen Siu Fai Hung Wing Ki Lo Yang Chen Yang Shen Kim Kafenda Jia Su Kangwei Xia Sen Yang |
| author_facet | Yifan Chen Siu Fai Hung Wing Ki Lo Yang Chen Yang Shen Kim Kafenda Jia Su Kangwei Xia Sen Yang |
| author_sort | Yifan Chen |
| collection | DOAJ |
| description | Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. |
| first_indexed | 2024-12-20T01:08:32Z |
| format | Article |
| id | doaj.art-8d20cb4494664a36bcc74e0483bc8022 |
| institution | Directory Open Access Journal |
| issn | 2041-1723 |
| language | English |
| last_indexed | 2024-12-20T01:08:32Z |
| publishDate | 2020-10-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj.art-8d20cb4494664a36bcc74e0483bc80222022-12-21T19:58:45ZengNature PortfolioNature Communications2041-17232020-10-011111810.1038/s41467-020-19210-0A universal method for depositing patterned materials in situYifan Chen0Siu Fai Hung1Wing Ki Lo2Yang Chen3Yang Shen4Kim Kafenda5Jia Su6Kangwei Xia7Sen Yang8Department of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Biology, South University of Science and Technology of ChinaDepartment of Physics, The Chinese University of Hong Kong, ShatinDepartment of Physics, The Chinese University of Hong Kong, ShatinComplexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping.https://doi.org/10.1038/s41467-020-19210-0 |
| spellingShingle | Yifan Chen Siu Fai Hung Wing Ki Lo Yang Chen Yang Shen Kim Kafenda Jia Su Kangwei Xia Sen Yang A universal method for depositing patterned materials in situ Nature Communications |
| title | A universal method for depositing patterned materials in situ |
| title_full | A universal method for depositing patterned materials in situ |
| title_fullStr | A universal method for depositing patterned materials in situ |
| title_full_unstemmed | A universal method for depositing patterned materials in situ |
| title_short | A universal method for depositing patterned materials in situ |
| title_sort | universal method for depositing patterned materials in situ |
| url | https://doi.org/10.1038/s41467-020-19210-0 |
| work_keys_str_mv | AT yifanchen auniversalmethodfordepositingpatternedmaterialsinsitu AT siufaihung auniversalmethodfordepositingpatternedmaterialsinsitu AT wingkilo auniversalmethodfordepositingpatternedmaterialsinsitu AT yangchen auniversalmethodfordepositingpatternedmaterialsinsitu AT yangshen auniversalmethodfordepositingpatternedmaterialsinsitu AT kimkafenda auniversalmethodfordepositingpatternedmaterialsinsitu AT jiasu auniversalmethodfordepositingpatternedmaterialsinsitu AT kangweixia auniversalmethodfordepositingpatternedmaterialsinsitu AT senyang auniversalmethodfordepositingpatternedmaterialsinsitu AT yifanchen universalmethodfordepositingpatternedmaterialsinsitu AT siufaihung universalmethodfordepositingpatternedmaterialsinsitu AT wingkilo universalmethodfordepositingpatternedmaterialsinsitu AT yangchen universalmethodfordepositingpatternedmaterialsinsitu AT yangshen universalmethodfordepositingpatternedmaterialsinsitu AT kimkafenda universalmethodfordepositingpatternedmaterialsinsitu AT jiasu universalmethodfordepositingpatternedmaterialsinsitu AT kangweixia universalmethodfordepositingpatternedmaterialsinsitu AT senyang universalmethodfordepositingpatternedmaterialsinsitu |