Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth
Kinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperatu...
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| Format: | Article |
| Language: | English |
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MDPI AG
2022-04-01
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| Series: | Surfaces |
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| Online Access: | https://www.mdpi.com/2571-9637/5/2/18 |
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| author | Tung B. T. To Fábio D. A. Aarão Reis |
| author_facet | Tung B. T. To Fábio D. A. Aarão Reis |
| author_sort | Tung B. T. To |
| collection | DOAJ |
| description | Kinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperature changes, in conditions of larger diffusivity on the substrate in comparison with other film layers. When films with the same coverage are compared, the roughness increases with the deposition temperature in the regimes of island growth, coalescence, and initial formation of the continuous films. Concomitantly, the position of the minimum of the autocorrelation function is displaced to larger sizes. These apparently universal trends are consequences of the formation of wider and taller islands, and are observed with or without Ehrlich-Schwöebel barriers for adatom diffusion at step edges. The roughness increase with temperature qualitatively matches the observations of recent works on the deposition of inorganic and organic materials. In thicker films, simulations with some parameter sets show the decrease of roughness with temperature. In these cases, a re-entrance of roughness may be observed in the initial formation of the continuous films. |
| first_indexed | 2024-03-09T22:29:05Z |
| format | Article |
| id | doaj.art-8f0003b935e84b67b755aac600444550 |
| institution | Directory Open Access Journal |
| issn | 2571-9637 |
| language | English |
| last_indexed | 2024-03-09T22:29:05Z |
| publishDate | 2022-04-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Surfaces |
| spelling | doaj.art-8f0003b935e84b67b755aac6004445502023-11-23T19:00:32ZengMDPI AGSurfaces2571-96372022-04-015225126410.3390/surfaces5020018Temperature Effects in the Initial Stages of Heteroepitaxial Film GrowthTung B. T. To0Fábio D. A. Aarão Reis1Instituto de Física, Universidade Federal Fluminense, Avenida Litorânea s/n, Nite rói 24210-340, RJ, BrazilInstituto de Física, Universidade Federal Fluminense, Avenida Litorânea s/n, Nite rói 24210-340, RJ, BrazilKinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperature changes, in conditions of larger diffusivity on the substrate in comparison with other film layers. When films with the same coverage are compared, the roughness increases with the deposition temperature in the regimes of island growth, coalescence, and initial formation of the continuous films. Concomitantly, the position of the minimum of the autocorrelation function is displaced to larger sizes. These apparently universal trends are consequences of the formation of wider and taller islands, and are observed with or without Ehrlich-Schwöebel barriers for adatom diffusion at step edges. The roughness increase with temperature qualitatively matches the observations of recent works on the deposition of inorganic and organic materials. In thicker films, simulations with some parameter sets show the decrease of roughness with temperature. In these cases, a re-entrance of roughness may be observed in the initial formation of the continuous films.https://www.mdpi.com/2571-9637/5/2/18thin filmsheteroepitaxytemperatureroughnessislandskinetic Monte Carlo |
| spellingShingle | Tung B. T. To Fábio D. A. Aarão Reis Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth Surfaces thin films heteroepitaxy temperature roughness islands kinetic Monte Carlo |
| title | Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth |
| title_full | Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth |
| title_fullStr | Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth |
| title_full_unstemmed | Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth |
| title_short | Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth |
| title_sort | temperature effects in the initial stages of heteroepitaxial film growth |
| topic | thin films heteroepitaxy temperature roughness islands kinetic Monte Carlo |
| url | https://www.mdpi.com/2571-9637/5/2/18 |
| work_keys_str_mv | AT tungbtto temperatureeffectsintheinitialstagesofheteroepitaxialfilmgrowth AT fabiodaaaraoreis temperatureeffectsintheinitialstagesofheteroepitaxialfilmgrowth |