A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
Plasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large are...
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2018-01-01
|
| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/8531589/ |
| _version_ | 1818428967107952640 |
|---|---|
| author | Yun Seon Do |
| author_facet | Yun Seon Do |
| author_sort | Yun Seon Do |
| collection | DOAJ |
| description | Plasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large areas. The optical structure of these plasmonic filters consists of 2-D hole arrays in a thin metal film. Although laser interference lithography technology allows a high accuracy of regularity across the whole fabrication region, the exposure light is easily disturbed by vibrations or dust in the air. The suggested process enhances the accuracy and reproducibility of nanopatterns, which also exhibit a high performance. This paper will help realize plasmonic filters in conjunction with industry. |
| first_indexed | 2024-12-14T15:10:02Z |
| format | Article |
| id | doaj.art-8fb77b1c6bc84d97b7d79e0ccc359361 |
| institution | Directory Open Access Journal |
| issn | 2169-3536 |
| language | English |
| last_indexed | 2024-12-14T15:10:02Z |
| publishDate | 2018-01-01 |
| publisher | IEEE |
| record_format | Article |
| series | IEEE Access |
| spelling | doaj.art-8fb77b1c6bc84d97b7d79e0ccc3593612022-12-21T22:56:36ZengIEEEIEEE Access2169-35362018-01-016689616896710.1109/ACCESS.2018.28804568531589A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical ApplicationsYun Seon Do0https://orcid.org/0000-0002-0715-8033School of Electronics Engineering, Kyungpook National University, Daegu, South KoreaPlasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large areas. The optical structure of these plasmonic filters consists of 2-D hole arrays in a thin metal film. Although laser interference lithography technology allows a high accuracy of regularity across the whole fabrication region, the exposure light is easily disturbed by vibrations or dust in the air. The suggested process enhances the accuracy and reproducibility of nanopatterns, which also exhibit a high performance. This paper will help realize plasmonic filters in conjunction with industry.https://ieeexplore.ieee.org/document/8531589/Laser interference lithographynano patterningsurface plasmonplasmonic filter |
| spellingShingle | Yun Seon Do A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications IEEE Access Laser interference lithography nano patterning surface plasmon plasmonic filter |
| title | A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications |
| title_full | A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications |
| title_fullStr | A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications |
| title_full_unstemmed | A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications |
| title_short | A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications |
| title_sort | highly reproducible fabrication process for large area plasmonic filters for optical applications |
| topic | Laser interference lithography nano patterning surface plasmon plasmonic filter |
| url | https://ieeexplore.ieee.org/document/8531589/ |
| work_keys_str_mv | AT yunseondo ahighlyreproduciblefabricationprocessforlargeareaplasmonicfiltersforopticalapplications AT yunseondo highlyreproduciblefabricationprocessforlargeareaplasmonicfiltersforopticalapplications |