Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering

The features of InAs quantum dots obtained on GaAs(001) single-crystal substrates by ion-beam sputtering were investigated. It has been shown that in the range of ion energies of 150 to 200 eV at a temperature of 500 °C and a beam current of 120 µA InAs quantum dots with average dimensions below 15...

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Main Authors: Sergei N. Chebotarev, Alexander S. Pashchenko, Leonid S. Lunin, Elena N. Zhivotova, Georgy A. Erimeev, Marina L. Lunina
Format: Article
Language:English
Published: Beilstein-Institut 2017-01-01
Series:Beilstein Journal of Nanotechnology
Subjects:
Online Access:https://doi.org/10.3762/bjnano.8.2
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author Sergei N. Chebotarev
Alexander S. Pashchenko
Leonid S. Lunin
Elena N. Zhivotova
Georgy A. Erimeev
Marina L. Lunina
author_facet Sergei N. Chebotarev
Alexander S. Pashchenko
Leonid S. Lunin
Elena N. Zhivotova
Georgy A. Erimeev
Marina L. Lunina
author_sort Sergei N. Chebotarev
collection DOAJ
description The features of InAs quantum dots obtained on GaAs(001) single-crystal substrates by ion-beam sputtering were investigated. It has been shown that in the range of ion energies of 150 to 200 eV at a temperature of 500 °C and a beam current of 120 µA InAs quantum dots with average dimensions below 15 nm and a surface density of 1011 cm−2 are formed. The technique of controlled doping of InAs/GaAs nanostructures using a SnTe solid-state source was proposed. It has been established that a maximum donor concentration of 8.7·1018 cm−3 in the GaAs spacer layer is reached at an evaporation temperature of 415 °С. At the same time, impurity accumulation in the growth direction was observed. We have shown that increasing the impurity doping of the GaAs barrier layer increases the intensity of photoluminescence peaks of the ground state and the first excited state of the InAs quantum dots.
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spelling doaj.art-900e9b5fa40e416bb164ff9b82da6ecf2022-12-21T22:58:20ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862017-01-0181122010.3762/bjnano.8.22190-4286-8-2Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputteringSergei N. Chebotarev0Alexander S. Pashchenko1Leonid S. Lunin2Elena N. Zhivotova3Georgy A. Erimeev4Marina L. Lunina5Department of Physics and Electronics, Platov South-Russian State Polytechnic University (NPI), 346428, 132, Prosveshchenia str., Novocherkassk, RussiaDepartment of Nanotechnology and Solar Energy, Southern Scientific Center of Russian Academy of Sciences, 344006, 41, Chekhov Avenue, Rostov-on-Don, RussiaDepartment of Nanotechnology and Solar Energy, Southern Scientific Center of Russian Academy of Sciences, 344006, 41, Chekhov Avenue, Rostov-on-Don, RussiaDepartment of Physics and Electronics, Platov South-Russian State Polytechnic University (NPI), 346428, 132, Prosveshchenia str., Novocherkassk, RussiaDepartment of Physics and Electronics, Platov South-Russian State Polytechnic University (NPI), 346428, 132, Prosveshchenia str., Novocherkassk, RussiaDepartment of Nanotechnology and Solar Energy, Southern Scientific Center of Russian Academy of Sciences, 344006, 41, Chekhov Avenue, Rostov-on-Don, RussiaThe features of InAs quantum dots obtained on GaAs(001) single-crystal substrates by ion-beam sputtering were investigated. It has been shown that in the range of ion energies of 150 to 200 eV at a temperature of 500 °C and a beam current of 120 µA InAs quantum dots with average dimensions below 15 nm and a surface density of 1011 cm−2 are formed. The technique of controlled doping of InAs/GaAs nanostructures using a SnTe solid-state source was proposed. It has been established that a maximum donor concentration of 8.7·1018 cm−3 in the GaAs spacer layer is reached at an evaporation temperature of 415 °С. At the same time, impurity accumulation in the growth direction was observed. We have shown that increasing the impurity doping of the GaAs barrier layer increases the intensity of photoluminescence peaks of the ground state and the first excited state of the InAs quantum dots.https://doi.org/10.3762/bjnano.8.23D growthdopingion-beam sputteringphotoluminescencequantum dots
spellingShingle Sergei N. Chebotarev
Alexander S. Pashchenko
Leonid S. Lunin
Elena N. Zhivotova
Georgy A. Erimeev
Marina L. Lunina
Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
Beilstein Journal of Nanotechnology
3D growth
doping
ion-beam sputtering
photoluminescence
quantum dots
title Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
title_full Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
title_fullStr Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
title_full_unstemmed Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
title_short Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering
title_sort obtaining and doping of inas qd gaas 001 nanostructures by ion beam sputtering
topic 3D growth
doping
ion-beam sputtering
photoluminescence
quantum dots
url https://doi.org/10.3762/bjnano.8.2
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