FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE

The results of porous silicon formation by anodization of single crystalline silicon wafers in the pulsed galvanostatic mode are presented. Correlations between pore structure and anodization process parameters were determined. It was shown, that porous silicon layers formed in pulsed mode have more...

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Main Authors: E. B. Chubenko, S. V. Redko, A. I. Sherstnyov, V. A. Petrovich, V. P. Bondarenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/484
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author E. B. Chubenko
S. V. Redko
A. I. Sherstnyov
V. A. Petrovich
V. P. Bondarenko
author_facet E. B. Chubenko
S. V. Redko
A. I. Sherstnyov
V. A. Petrovich
V. P. Bondarenko
author_sort E. B. Chubenko
collection DOAJ
description The results of porous silicon formation by anodization of single crystalline silicon wafers in the pulsed galvanostatic mode are presented. Correlations between pore structure and anodization process parameters were determined. It was shown, that porous silicon layers formed in pulsed mode have more uniform structure than porous silicon layers obtained in linear galvanostatic mode. Porous silicon templates with aspect ratio up to 1:500 were formed with the developed approach.
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spelling doaj.art-908ff34480004edb9dc253a076eb443d2023-03-13T07:33:12ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01031117483FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODEE. B. Chubenko0S. V. Redko1A. I. Sherstnyov2V. A. Petrovich3V. P. Bondarenko4Белорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиThe results of porous silicon formation by anodization of single crystalline silicon wafers in the pulsed galvanostatic mode are presented. Correlations between pore structure and anodization process parameters were determined. It was shown, that porous silicon layers formed in pulsed mode have more uniform structure than porous silicon layers obtained in linear galvanostatic mode. Porous silicon templates with aspect ratio up to 1:500 were formed with the developed approach.https://doklady.bsuir.by/jour/article/view/484пористый кремнийимпульсное электрохимическое анодированиеполупроводниковая пористая матрица
spellingShingle E. B. Chubenko
S. V. Redko
A. I. Sherstnyov
V. A. Petrovich
V. P. Bondarenko
FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
пористый кремний
импульсное электрохимическое анодирование
полупроводниковая пористая матрица
title FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
title_full FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
title_fullStr FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
title_full_unstemmed FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
title_short FORMATION OF POROUS SILICON IN THE PULSED GALVANOSTATIC MODE
title_sort formation of porous silicon in the pulsed galvanostatic mode
topic пористый кремний
импульсное электрохимическое анодирование
полупроводниковая пористая матрица
url https://doklady.bsuir.by/jour/article/view/484
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