Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors

We present a concept for a wafer-level manufactured photoacoustic transducer, suitable to be used in consumer-grade gas sensors. The transducer consists of an anodically bonded two-layer stack of a blank silicon wafer and an 11 µm membrane, which was wet-etched from a borosilicate wafer. The membran...

Full description

Bibliographic Details
Main Authors: Simon Gassner, Rainer Schaller, Matthias Eberl, Carsten von Koblinski, Simon Essing, Mohammadamir Ghaderi, Katrin Schmitt, Jürgen Wöllenstein
Format: Article
Language:English
Published: MDPI AG 2022-01-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/22/2/685
_version_ 1797490413482803200
author Simon Gassner
Rainer Schaller
Matthias Eberl
Carsten von Koblinski
Simon Essing
Mohammadamir Ghaderi
Katrin Schmitt
Jürgen Wöllenstein
author_facet Simon Gassner
Rainer Schaller
Matthias Eberl
Carsten von Koblinski
Simon Essing
Mohammadamir Ghaderi
Katrin Schmitt
Jürgen Wöllenstein
author_sort Simon Gassner
collection DOAJ
description We present a concept for a wafer-level manufactured photoacoustic transducer, suitable to be used in consumer-grade gas sensors. The transducer consists of an anodically bonded two-layer stack of a blank silicon wafer and an 11 µm membrane, which was wet-etched from a borosilicate wafer. The membrane separates two cavities; one of which was hermetically sealed and filled with CO<sub>2</sub> during the anodic bonding and acts as an infrared absorber. The second cavity was designed to be connected to a standard MEMS microphone on PCB-level forming an infrared-sensitive photoacoustic detector. CO<sub>2</sub> sensors consisting of the detector and a MEMS infrared emitter were built up and characterized towards their sensitivity and noise levels at six different component distance ranging from 3.0 mm to 15.5 mm. The signal response for the sample with the longest absorption path ranged from a decrease of 8.3% at a CO<sub>2</sub> concentration of 9400 ppm to a decrease of <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mrow><mn>0.8</mn></mrow></semantics></math></inline-formula>% at a concentration of 560 ppm. A standard deviation of the measured values of 18 ppm was determined when the sensor was exposed to 1000 ppm CO<sub>2</sub>.
first_indexed 2024-03-10T00:32:39Z
format Article
id doaj.art-91ca3e580c454d9b8cca6919353b70c5
institution Directory Open Access Journal
issn 1424-8220
language English
last_indexed 2024-03-10T00:32:39Z
publishDate 2022-01-01
publisher MDPI AG
record_format Article
series Sensors
spelling doaj.art-91ca3e580c454d9b8cca6919353b70c52023-11-23T15:22:46ZengMDPI AGSensors1424-82202022-01-0122268510.3390/s22020685Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas SensorsSimon Gassner0Rainer Schaller1Matthias Eberl2Carsten von Koblinski3Simon Essing4Mohammadamir Ghaderi5Katrin Schmitt6Jürgen Wöllenstein7Department of Microsystems Engineering (IMTEK), Albert-Ludwigs-Universität Freiburg, 79085 Freiburg im Breisgau, GermanyInfineon Technologies AG, 81549 Neubiberg, GermanyInfineon Technologies AG, 81549 Neubiberg, GermanyInfineon Technologies Austria AG, 9500 Villach, AustriaDepartment of Electrical and Computer Engineering, Technical University of Munich, 80333 München, GermanyInfineon Technologies AG, 81549 Neubiberg, GermanyDepartment of Microsystems Engineering (IMTEK), Albert-Ludwigs-Universität Freiburg, 79085 Freiburg im Breisgau, GermanyDepartment of Microsystems Engineering (IMTEK), Albert-Ludwigs-Universität Freiburg, 79085 Freiburg im Breisgau, GermanyWe present a concept for a wafer-level manufactured photoacoustic transducer, suitable to be used in consumer-grade gas sensors. The transducer consists of an anodically bonded two-layer stack of a blank silicon wafer and an 11 µm membrane, which was wet-etched from a borosilicate wafer. The membrane separates two cavities; one of which was hermetically sealed and filled with CO<sub>2</sub> during the anodic bonding and acts as an infrared absorber. The second cavity was designed to be connected to a standard MEMS microphone on PCB-level forming an infrared-sensitive photoacoustic detector. CO<sub>2</sub> sensors consisting of the detector and a MEMS infrared emitter were built up and characterized towards their sensitivity and noise levels at six different component distance ranging from 3.0 mm to 15.5 mm. The signal response for the sample with the longest absorption path ranged from a decrease of 8.3% at a CO<sub>2</sub> concentration of 9400 ppm to a decrease of <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mrow><mn>0.8</mn></mrow></semantics></math></inline-formula>% at a concentration of 560 ppm. A standard deviation of the measured values of 18 ppm was determined when the sensor was exposed to 1000 ppm CO<sub>2</sub>.https://www.mdpi.com/1424-8220/22/2/685gas sensorphotoacousticpressure transducerwafer-levelCO<sub>2</sub>
spellingShingle Simon Gassner
Rainer Schaller
Matthias Eberl
Carsten von Koblinski
Simon Essing
Mohammadamir Ghaderi
Katrin Schmitt
Jürgen Wöllenstein
Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
Sensors
gas sensor
photoacoustic
pressure transducer
wafer-level
CO<sub>2</sub>
title Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
title_full Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
title_fullStr Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
title_full_unstemmed Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
title_short Anodically Bonded Photoacoustic Transducer: An Approach towards Wafer-Level Optical Gas Sensors
title_sort anodically bonded photoacoustic transducer an approach towards wafer level optical gas sensors
topic gas sensor
photoacoustic
pressure transducer
wafer-level
CO<sub>2</sub>
url https://www.mdpi.com/1424-8220/22/2/685
work_keys_str_mv AT simongassner anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT rainerschaller anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT matthiaseberl anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT carstenvonkoblinski anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT simonessing anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT mohammadamirghaderi anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT katrinschmitt anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors
AT jurgenwollenstein anodicallybondedphotoacoustictransduceranapproachtowardswaferlevelopticalgassensors