Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”

Bibliographic Details
Main Authors: Wansuo Liu, Xiangji Yue, Zeng Lin
Format: Article
Language:English
Published: American Chemical Society 2024-02-01
Series:ACS Omega
Online Access:https://doi.org/10.1021/acsomega.4c01652
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author Wansuo Liu
Xiangji Yue
Zeng Lin
author_facet Wansuo Liu
Xiangji Yue
Zeng Lin
author_sort Wansuo Liu
collection DOAJ
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institution Directory Open Access Journal
issn 2470-1343
language English
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spelling doaj.art-923a44b247194f63978c97a07bc05a3a2024-03-12T09:20:50ZengAmerican Chemical SocietyACS Omega2470-13432024-02-01910122911229110.1021/acsomega.4c01652Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”Wansuo LiuXiangji YueZeng Linhttps://doi.org/10.1021/acsomega.4c01652
spellingShingle Wansuo Liu
Xiangji Yue
Zeng Lin
Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
ACS Omega
title Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
title_full Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
title_fullStr Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
title_full_unstemmed Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
title_short Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
title_sort retraction of effect of fluoride layer growth on the deposition rate under different microchannel structures
url https://doi.org/10.1021/acsomega.4c01652
work_keys_str_mv AT wansuoliu retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures
AT xiangjiyue retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures
AT zenglin retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures