Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
American Chemical Society
2024-02-01
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Series: | ACS Omega |
Online Access: | https://doi.org/10.1021/acsomega.4c01652 |
_version_ | 1797265196316622848 |
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author | Wansuo Liu Xiangji Yue Zeng Lin |
author_facet | Wansuo Liu Xiangji Yue Zeng Lin |
author_sort | Wansuo Liu |
collection | DOAJ |
first_indexed | 2024-04-25T00:40:57Z |
format | Article |
id | doaj.art-923a44b247194f63978c97a07bc05a3a |
institution | Directory Open Access Journal |
issn | 2470-1343 |
language | English |
last_indexed | 2024-04-25T00:40:57Z |
publishDate | 2024-02-01 |
publisher | American Chemical Society |
record_format | Article |
series | ACS Omega |
spelling | doaj.art-923a44b247194f63978c97a07bc05a3a2024-03-12T09:20:50ZengAmerican Chemical SocietyACS Omega2470-13432024-02-01910122911229110.1021/acsomega.4c01652Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures”Wansuo LiuXiangji YueZeng Linhttps://doi.org/10.1021/acsomega.4c01652 |
spellingShingle | Wansuo Liu Xiangji Yue Zeng Lin Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” ACS Omega |
title | Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” |
title_full | Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” |
title_fullStr | Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” |
title_full_unstemmed | Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” |
title_short | Retraction of “Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures” |
title_sort | retraction of effect of fluoride layer growth on the deposition rate under different microchannel structures |
url | https://doi.org/10.1021/acsomega.4c01652 |
work_keys_str_mv | AT wansuoliu retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures AT xiangjiyue retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures AT zenglin retractionofeffectoffluoridelayergrowthonthedepositionrateunderdifferentmicrochannelstructures |