Contrast Experiments in Dielectrophoresis Polishing (DEPP)/Chemical Mechanical Polishing (CMP) of Sapphire Substrate

Contrast Experiments in Dielectrophoresis Polishing (DEPP)/Chemical Mechanical Polishing (CMP) of Sapphire Substrate

The broad applications of sapphire substrates in many fields warrants an urgent demand for a highly efficient and high precision polishing method for the sapphire substrates. The authors proposed a novel sapphire substrate polishing method that is based on the dielectrophoresis (DEP) effect. The pri...

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Bibliographic Details
Main Authors: Tianchen Zhao, Julong Yuan, Qianfa Deng, Kaiping Feng, Zhaozhong Zhou, Xu Wang
Format: Article
Language:English
Published: MDPI AG 2019-09-01
Series:Applied Sciences
Subjects:
dielectrophoresis (DEP)
polishing
sapphire substrate
material removal rate
surface roughness
flatness
Online Access:https://www.mdpi.com/2076-3417/9/18/3704

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