Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material
Micro- and nanopatterns perform unique functions and have attracted attention in various industrial fields, such as electronic devices, microfluidics, biotechnology, optics, sensors, and smart and anti-adhesion surfaces. To put fine-patterned products to practical use, low-cost patterning technology...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-07-01
|
| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/13/14/2031 |
| _version_ | 1827732185209110528 |
|---|---|
| author | Noriyuki Unno Tapio Mäkelä |
| author_facet | Noriyuki Unno Tapio Mäkelä |
| author_sort | Noriyuki Unno |
| collection | DOAJ |
| description | Micro- and nanopatterns perform unique functions and have attracted attention in various industrial fields, such as electronic devices, microfluidics, biotechnology, optics, sensors, and smart and anti-adhesion surfaces. To put fine-patterned products to practical use, low-cost patterning technology is necessary. Nanoimprint lithography (NIL) is a promising technique for high-throughput nanopattern fabrication. In particular, thermal nanoimprint lithography (T-NIL) has the advantage of employing flexible materials and eliminating chemicals and solvents. Moreover, T-NIL is particularly suitable for compostable and recyclable materials, especially when applying biobased materials for use in optics and electronics. These attributes make T-NIL an eco-friendly process. However, the processing time of normal T-NIL is longer than that of ultraviolet (UV) NIL using a UV-curable resin because the T-NIL process requires heating and cooling time. Therefore, many studies focus on improving the throughput of T-NIL. Specifically, a T-NIL process based on a roll-to-roll web system shows promise for next-generation nanopatterning techniques because it enables large-area applications with the capability to process webs several meters in width. In this review, the T-NIL process, roll mold fabrication techniques, and various materials are introduced. Moreover, metal pattern transfer techniques using a combination of nanotransfer printing, T-NIL, and a reverse offset are introduced. |
| first_indexed | 2024-03-11T00:47:04Z |
| format | Article |
| id | doaj.art-9348259449424533a4ec8b460808a1c4 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-11T00:47:04Z |
| publishDate | 2023-07-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-9348259449424533a4ec8b460808a1c42023-11-18T20:44:59ZengMDPI AGNanomaterials2079-49912023-07-011314203110.3390/nano13142031Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and MaterialNoriyuki Unno0Tapio Mäkelä1Department of Applied Electronics, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585, JapanVTT Printed and Hybrid Functionalities, Tietotie 3, P.O. Box 1000, FI-02044 VTT Espoo, FinlandMicro- and nanopatterns perform unique functions and have attracted attention in various industrial fields, such as electronic devices, microfluidics, biotechnology, optics, sensors, and smart and anti-adhesion surfaces. To put fine-patterned products to practical use, low-cost patterning technology is necessary. Nanoimprint lithography (NIL) is a promising technique for high-throughput nanopattern fabrication. In particular, thermal nanoimprint lithography (T-NIL) has the advantage of employing flexible materials and eliminating chemicals and solvents. Moreover, T-NIL is particularly suitable for compostable and recyclable materials, especially when applying biobased materials for use in optics and electronics. These attributes make T-NIL an eco-friendly process. However, the processing time of normal T-NIL is longer than that of ultraviolet (UV) NIL using a UV-curable resin because the T-NIL process requires heating and cooling time. Therefore, many studies focus on improving the throughput of T-NIL. Specifically, a T-NIL process based on a roll-to-roll web system shows promise for next-generation nanopatterning techniques because it enables large-area applications with the capability to process webs several meters in width. In this review, the T-NIL process, roll mold fabrication techniques, and various materials are introduced. Moreover, metal pattern transfer techniques using a combination of nanotransfer printing, T-NIL, and a reverse offset are introduced.https://www.mdpi.com/2079-4991/13/14/2031thermal nanoimprintseamless roll moldreplica moldroll-to-rollcompostable films |
| spellingShingle | Noriyuki Unno Tapio Mäkelä Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material Nanomaterials thermal nanoimprint seamless roll mold replica mold roll-to-roll compostable films |
| title | Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material |
| title_full | Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material |
| title_fullStr | Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material |
| title_full_unstemmed | Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material |
| title_short | Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material |
| title_sort | thermal nanoimprint lithography a review of the process mold fabrication and material |
| topic | thermal nanoimprint seamless roll mold replica mold roll-to-roll compostable films |
| url | https://www.mdpi.com/2079-4991/13/14/2031 |
| work_keys_str_mv | AT noriyukiunno thermalnanoimprintlithographyareviewoftheprocessmoldfabricationandmaterial AT tapiomakela thermalnanoimprintlithographyareviewoftheprocessmoldfabricationandmaterial |