Fast and low-temperature reduction of graphene oxide films using ammonia plasma

Reduced graphene oxide (rGO) has been produced using an ammonia (NH3) plasma reduction method. Simultaneous nitrogen doping during the reduction process enabled a rapid and low-temperature restoration of the electrical properties of the rGO. The chemical, structural, and electrical properties of the...

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Bibliographic Details
Main Authors: Maeng Jun Kim, Yonkil Jeong, SangHo Sohn, Sung Yeup Lee, Yong Jae Kim, Kwanghee Lee, Yung Ho Kahng, Jae-Hyung Jang
Format: Article
Language:English
Published: AIP Publishing LLC 2013-01-01
Series:AIP Advances
Online Access:http://link.aip.org/link/doi/10.1063/1.4789545
Description
Summary:Reduced graphene oxide (rGO) has been produced using an ammonia (NH3) plasma reduction method. Simultaneous nitrogen doping during the reduction process enabled a rapid and low-temperature restoration of the electrical properties of the rGO. The chemical, structural, and electrical properties of the rGO films were analyzed using x-ray photoelectron spectroscopy, Raman spectroscopy, atomic force microscopy, and conductivity measurements. The oxygen functional groups were efficiently removed, and simultaneous nitrogen doping (6%) was carried out. In addition, the surface of the rGO film was flattened. Consequently, the rGO films exhibited electrical properties comparable to those prepared via other reduction methods.
ISSN:2158-3226