Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell
Abstract In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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SpringerOpen
2019-06-01
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| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | http://link.springer.com/article/10.1186/s11671-019-3030-y |
| _version_ | 1797711595290230784 |
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| author | Chen-Chih Hsueh Subramani Thiyagu Chien-Ting Liu Hong-Jhang Syu Song-Ting Yang Ching-Fuh Lin |
| author_facet | Chen-Chih Hsueh Subramani Thiyagu Chien-Ting Liu Hong-Jhang Syu Song-Ting Yang Ching-Fuh Lin |
| author_sort | Chen-Chih Hsueh |
| collection | DOAJ |
| description | Abstract In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation wafers. The SiNW arrays are 470 nm in length with high density; they demonstrate a good optical trapping effect and reflectance well below 6% over a broad wavelength range from 300 to 1100 nm. The improved MacEtch shows no difference in reflectance for a pyramid/SiNW mono-crystalline wafer with appropriate uniformity; the average delta from the center to other positions is within 22%. The effective lifetime is lower for SiNW arrays because the higher surface state causes higher surface recombination. Finally, we make the multi-crystalline wafer into an Al-BSF solar cell device with MacEtch SiNW texture, resulting in an averaged power conversion efficiency of 17.83%, which is higher than that of standard acid-textured solar cell devices. Consequently, the improved MacEtch concept is suitable for commercial mass production in the photovoltaic industry. |
| first_indexed | 2024-03-12T07:09:23Z |
| format | Article |
| id | doaj.art-966e6bfbf92f4b44b771a8ed2c81fd46 |
| institution | Directory Open Access Journal |
| issn | 1931-7573 1556-276X |
| language | English |
| last_indexed | 2024-03-12T07:09:23Z |
| publishDate | 2019-06-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nanoscale Research Letters |
| spelling | doaj.art-966e6bfbf92f4b44b771a8ed2c81fd462023-09-02T23:15:45ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2019-06-0114111210.1186/s11671-019-3030-yApplication of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar CellChen-Chih Hsueh0Subramani Thiyagu1Chien-Ting Liu2Hong-Jhang Syu3Song-Ting Yang4Ching-Fuh Lin5Graduate Institute of Photonics and Optoelectronics, National Taiwan UniversityGraduate Institute of Photonics and Optoelectronics, National Taiwan UniversityGraduate Institute of Photonics and Optoelectronics, National Taiwan UniversityGraduate Institute of Photonics and Optoelectronics, National Taiwan UniversityGraduate Institute of Electronics Engineering, National Taiwan UniversityGraduate Institute of Photonics and Optoelectronics, National Taiwan UniversityAbstract In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation wafers. The SiNW arrays are 470 nm in length with high density; they demonstrate a good optical trapping effect and reflectance well below 6% over a broad wavelength range from 300 to 1100 nm. The improved MacEtch shows no difference in reflectance for a pyramid/SiNW mono-crystalline wafer with appropriate uniformity; the average delta from the center to other positions is within 22%. The effective lifetime is lower for SiNW arrays because the higher surface state causes higher surface recombination. Finally, we make the multi-crystalline wafer into an Al-BSF solar cell device with MacEtch SiNW texture, resulting in an averaged power conversion efficiency of 17.83%, which is higher than that of standard acid-textured solar cell devices. Consequently, the improved MacEtch concept is suitable for commercial mass production in the photovoltaic industry.http://link.springer.com/article/10.1186/s11671-019-3030-ySilicon nanowireMetal-assisted chemical etchingLow reflectanceSix-inch waferCarrier lifetime |
| spellingShingle | Chen-Chih Hsueh Subramani Thiyagu Chien-Ting Liu Hong-Jhang Syu Song-Ting Yang Ching-Fuh Lin Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell Nanoscale Research Letters Silicon nanowire Metal-assisted chemical etching Low reflectance Six-inch wafer Carrier lifetime |
| title | Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell |
| title_full | Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell |
| title_fullStr | Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell |
| title_full_unstemmed | Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell |
| title_short | Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell |
| title_sort | application of silicon nanostructure arrays for 6 inch mono and multi crystalline solar cell |
| topic | Silicon nanowire Metal-assisted chemical etching Low reflectance Six-inch wafer Carrier lifetime |
| url | http://link.springer.com/article/10.1186/s11671-019-3030-y |
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