Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry
We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology...
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Format: | Article |
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MDPI AG
2012-08-01
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Series: | Molecules |
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Online Access: | http://www.mdpi.com/1420-3049/17/9/10119 |
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author | Michael J. Brett Jaron G. Van Dijken |
author_facet | Michael J. Brett Jaron G. Van Dijken |
author_sort | Michael J. Brett |
collection | DOAJ |
description | We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology are independent of plasma power, which controls the etch rate only. Analysis by X-ray photoelectron spectroscopy shows that surface concentrations of copper and oxygen increase with etch time, while carbon and nitrogen are depleted. Despite these changes in surface stoichiometry, we observe no effect on the work function. The absorbance and X-ray diffraction spectra show no changes other than the peaks diminishing with etch time. These findings have important implications for organic photovoltaic devices which seek nanopillar thin films of metal phthalocyanine materials as an optimal structure. |
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format | Article |
id | doaj.art-990b4fd00cde4c9fb7bb5abd8c7eeb53 |
institution | Directory Open Access Journal |
issn | 1420-3049 |
language | English |
last_indexed | 2024-12-14T01:08:17Z |
publishDate | 2012-08-01 |
publisher | MDPI AG |
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series | Molecules |
spelling | doaj.art-990b4fd00cde4c9fb7bb5abd8c7eeb532022-12-21T23:22:53ZengMDPI AGMolecules1420-30492012-08-01179101191013010.3390/molecules170910119Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface StoichiometryMichael J. BrettJaron G. Van DijkenWe investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology are independent of plasma power, which controls the etch rate only. Analysis by X-ray photoelectron spectroscopy shows that surface concentrations of copper and oxygen increase with etch time, while carbon and nitrogen are depleted. Despite these changes in surface stoichiometry, we observe no effect on the work function. The absorbance and X-ray diffraction spectra show no changes other than the peaks diminishing with etch time. These findings have important implications for organic photovoltaic devices which seek nanopillar thin films of metal phthalocyanine materials as an optimal structure.http://www.mdpi.com/1420-3049/17/9/10119phthalocyanine dyesvapor phase processesdry etchingnanopillar formation |
spellingShingle | Michael J. Brett Jaron G. Van Dijken Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry Molecules phthalocyanine dyes vapor phase processes dry etching nanopillar formation |
title | Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry |
title_full | Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry |
title_fullStr | Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry |
title_full_unstemmed | Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry |
title_short | Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry |
title_sort | dry etching of copper phthalocyanine thin films effects on morphology and surface stoichiometry |
topic | phthalocyanine dyes vapor phase processes dry etching nanopillar formation |
url | http://www.mdpi.com/1420-3049/17/9/10119 |
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