Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications

In the last decade, transparent amorphous oxide semiconductors (TAOS) have become an essential component of many electronics, from ultra high resolution displays to solar cells. However, these disordered oxides typically rely on expensive component metals like indium to provide sufficient charge car...

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Main Authors: Matthew J. Wahila, Zachary W. Lebens-Higgins, Keith T. Butler, Daniel Fritsch, Robert E. Treharne, Robert G. Palgrave, Joseph C. Woicik, Benjamin J. Morgan, Aron Walsh, Louis F. J. Piper
Format: Article
Language:English
Published: AIP Publishing LLC 2019-02-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5053683
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author Matthew J. Wahila
Zachary W. Lebens-Higgins
Keith T. Butler
Daniel Fritsch
Robert E. Treharne
Robert G. Palgrave
Joseph C. Woicik
Benjamin J. Morgan
Aron Walsh
Louis F. J. Piper
author_facet Matthew J. Wahila
Zachary W. Lebens-Higgins
Keith T. Butler
Daniel Fritsch
Robert E. Treharne
Robert G. Palgrave
Joseph C. Woicik
Benjamin J. Morgan
Aron Walsh
Louis F. J. Piper
author_sort Matthew J. Wahila
collection DOAJ
description In the last decade, transparent amorphous oxide semiconductors (TAOS) have become an essential component of many electronics, from ultra high resolution displays to solar cells. However, these disordered oxides typically rely on expensive component metals like indium to provide sufficient charge carrier conduction, and their optoelectronic properties are not as predictable and well-described as those of traditional, crystalline semiconductors. Herein we report on our comprehensive study of the amorphous zinc-tin-oxide (a-ZTO) system for use as an indium-free, n-type TAOS. Using a combination of high-throughput co-deposition growth, high resolution spectral mapping, and atomistic calculations, we explain the development of disorder-related subgap states in SnO2-like a-ZTO and optical bandgap reduction in ZnO-like a-ZTO. In addition, we report on a composition-induced electronic and structural transition in ZnO-like a-ZTO resulting in an exceptionally high figure of merit, comparable to that of amorphous indium-gallium-zinc-oxide. Our results accelerate the development of a-ZTO and similar systems as indium-free TAOS materials.
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spelling doaj.art-990cded0ca18440aafd78b86df6872582022-12-22T00:28:44ZengAIP Publishing LLCAPL Materials2166-532X2019-02-0172022509022509-910.1063/1.5053683020992APMAccelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applicationsMatthew J. Wahila0Zachary W. Lebens-Higgins1Keith T. Butler2Daniel Fritsch3Robert E. Treharne4Robert G. Palgrave5Joseph C. Woicik6Benjamin J. Morgan7Aron Walsh8Louis F. J. Piper9Department of Physics, Applied Physics and Astronomy, Binghamton University, Binghamton, New York 13902, USADepartment of Physics, Applied Physics and Astronomy, Binghamton University, Binghamton, New York 13902, USADepartment of Chemistry, University of Bath, Claverton Down, Bath BA2 7AY, United KingdomDepartment Structure and Dynamics of Energy Materials, Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109 Berlin, GermanyStephenson Institute for Renewable Energy, University of Liverpool, Liverpool L69 7ZF, United KingdomUniversity College London, Department of Chemistry, 20 Gordon Street, London WC1H 0AJ, United KingdomMaterials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USADepartment of Chemistry, University of Bath, Claverton Down, Bath BA2 7AY, United KingdomDepartment of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, United KingdomMaterials Science and Engineering, Binghamton University, Binghamton, New York 13902, USAIn the last decade, transparent amorphous oxide semiconductors (TAOS) have become an essential component of many electronics, from ultra high resolution displays to solar cells. However, these disordered oxides typically rely on expensive component metals like indium to provide sufficient charge carrier conduction, and their optoelectronic properties are not as predictable and well-described as those of traditional, crystalline semiconductors. Herein we report on our comprehensive study of the amorphous zinc-tin-oxide (a-ZTO) system for use as an indium-free, n-type TAOS. Using a combination of high-throughput co-deposition growth, high resolution spectral mapping, and atomistic calculations, we explain the development of disorder-related subgap states in SnO2-like a-ZTO and optical bandgap reduction in ZnO-like a-ZTO. In addition, we report on a composition-induced electronic and structural transition in ZnO-like a-ZTO resulting in an exceptionally high figure of merit, comparable to that of amorphous indium-gallium-zinc-oxide. Our results accelerate the development of a-ZTO and similar systems as indium-free TAOS materials.http://dx.doi.org/10.1063/1.5053683
spellingShingle Matthew J. Wahila
Zachary W. Lebens-Higgins
Keith T. Butler
Daniel Fritsch
Robert E. Treharne
Robert G. Palgrave
Joseph C. Woicik
Benjamin J. Morgan
Aron Walsh
Louis F. J. Piper
Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
APL Materials
title Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
title_full Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
title_fullStr Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
title_full_unstemmed Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
title_short Accelerated optimization of transparent, amorphous zinc-tin-oxide thin films for optoelectronic applications
title_sort accelerated optimization of transparent amorphous zinc tin oxide thin films for optoelectronic applications
url http://dx.doi.org/10.1063/1.5053683
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