Van der Waals engineering of ferroelectric heterostructures for long-retention memory

The memory retention for a ferroelectric field-effect transistor is limited by the depolarization effects and carrier charge trapping. Here, the authors fabricate a long-retention memory cell with a metal-ferroelectric-metal-insulator-semiconductor architecture built from all van der Waals single cr...

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Bibliographic Details
Main Authors: Xiaowei Wang, Chao Zhu, Ya Deng, Ruihuan Duan, Jieqiong Chen, Qingsheng Zeng, Jiadong Zhou, Qundong Fu, Lu You, Song Liu, James H. Edgar, Peng Yu, Zheng Liu
Format: Article
Language:English
Published: Nature Portfolio 2021-02-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-021-21320-2
Description
Summary:The memory retention for a ferroelectric field-effect transistor is limited by the depolarization effects and carrier charge trapping. Here, the authors fabricate a long-retention memory cell with a metal-ferroelectric-metal-insulator-semiconductor architecture built from all van der Waals single crystals.
ISSN:2041-1723