Electron glass effects in amorphous NbSi films

We report on non equilibrium field effect in insulating amorphous NbSi thin films having different Nb contents and thicknesses. The hallmark of an electron glass, namely the logarithmic growth of a memory dip in conductance versus gate voltage curves, is observed in all the films after a cooling...

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Main Author: Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
Format: Article
Language:English
Published: SciPost 2020-04-01
Series:SciPost Physics
Online Access:https://scipost.org/SciPostPhys.8.4.056
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author Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
author_facet Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
author_sort Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
collection DOAJ
description We report on non equilibrium field effect in insulating amorphous NbSi thin films having different Nb contents and thicknesses. The hallmark of an electron glass, namely the logarithmic growth of a memory dip in conductance versus gate voltage curves, is observed in all the films after a cooling from room temperature to 4.2 K. A very rich phenomenology is demonstrated. While the memory dip width is found to strongly vary with the film parameters, as was also observed in amorphous indium oxide films, screening lengths and temperature dependence of the dynamics are closer to what is observed in granular Al films. Our results demonstrate that the differentiation between continuous and discontinuous systems is not relevant to understand the discrepancies reported between various systems in the electron glass features. We suggest instead that they are not of fundamental nature and stem from differences in the protocols used and in the electrical inhomogeneity length scales within each material.
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spelling doaj.art-9c81aab804b14caa9fc9e6780c1822492022-12-21T22:32:43ZengSciPostSciPost Physics2542-46532020-04-018405610.21468/SciPostPhys.8.4.056Electron glass effects in amorphous NbSi filmsJulien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis DumoulinWe report on non equilibrium field effect in insulating amorphous NbSi thin films having different Nb contents and thicknesses. The hallmark of an electron glass, namely the logarithmic growth of a memory dip in conductance versus gate voltage curves, is observed in all the films after a cooling from room temperature to 4.2 K. A very rich phenomenology is demonstrated. While the memory dip width is found to strongly vary with the film parameters, as was also observed in amorphous indium oxide films, screening lengths and temperature dependence of the dynamics are closer to what is observed in granular Al films. Our results demonstrate that the differentiation between continuous and discontinuous systems is not relevant to understand the discrepancies reported between various systems in the electron glass features. We suggest instead that they are not of fundamental nature and stem from differences in the protocols used and in the electrical inhomogeneity length scales within each material.https://scipost.org/SciPostPhys.8.4.056
spellingShingle Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
Electron glass effects in amorphous NbSi films
SciPost Physics
title Electron glass effects in amorphous NbSi films
title_full Electron glass effects in amorphous NbSi films
title_fullStr Electron glass effects in amorphous NbSi films
title_full_unstemmed Electron glass effects in amorphous NbSi films
title_short Electron glass effects in amorphous NbSi films
title_sort electron glass effects in amorphous nbsi films
url https://scipost.org/SciPostPhys.8.4.056
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