Integration of periodic, sub‐wavelength structures in silicon‐on‐insulator photonic device design
Rapid advances in high‐resolution chip lithography have accelerated nanophotonic device development on the silicon‐on‐insulator (SOI) platform. The ability to create sub‐wavelength features in silicon has attracted research in photonic band and dispersion engineering and consequently made available...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2020-06-01
|
| Series: | IET Optoelectronics |
| Subjects: | |
| Online Access: | https://doi.org/10.1049/iet-opt.2019.0077 |